SCHEMBL2709422

SCHEMBL2709422

CC(C)Cc1ccc(S)c(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 1/20 0.37
GABRB2 P47870 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.35
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
HPGD P15428 1/20 0.35
DPP4 P27487 3/20 0.33
BCL2 P10415 1/20 0.33
MCL1 Q07820 1/20 0.33
MMP1 P03956 2/20 0.32
ELANE P08246 1/20 0.31
CTSG P08311 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
PDE4A P27815 1/20 0.31
PDE4B Q07343 1/20 0.31
PDE4C Q08493 1/20 0.31
PDE4D Q08499 1/20 0.31
ADORA2A P29274 2/20 0.31
ADORA1 P30542 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL3867909 0.85 ELANE (0.34) GABRA1GABRB2DPP4BCL2MCL1
SCHEMBL29206293 0.79
SCHEMBL943149 0.72 GABRA1 (0.54) GABRA1GABRB2MMP1ADORA2AADORA1
SCHEMBL19261467 0.70 GABRA1 (0.47) GABRA1GABRB2SMN1; SMN2KDM4EALDH1A1
SCHEMBL7066663 0.69 GABRA1 (0.35) GABRA1GABRB2SMN1; SMN2KDM4EALDH1A1
SCHEMBL28362447 0.69 ESR1 (0.42) SMN1; SMN2KDM4EALDH1A1HPGDDPP4
SCHEMBL21531036 0.69 BRD4 (0.38) SMN1; SMN2ALDH1A1HPGDNPC1RAB9A
SCHEMBL30481171 0.68 GABRA1 (0.40) GABRA1GABRB2SMN1; SMN2KDM4EALDH1A1
SCHEMBL29047890 0.68 GABRA1 (0.40) GABRA1GABRB2SMN1; SMN2KDM4EALDH1A1
SCHEMBL2866693 0.68 GABRA1 (0.45) GABRA1GABRB2SMN1; SMN2KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1637928-B1 Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same DONGJIN SEMICHEM CO LTD (KR) 2012-05-02 EP claimed