SCHEMBL27101395

SCHEMBL27101395

CCCCCCCCC(CC)c1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NR1I2 O75469 1/20 0.73
▸ S1PR3 Q99500 2/20 0.41
▸ MMP9 P14780 2/20 0.39
▸ MMP13 P45452 2/20 0.39
▸ ADAM17 P78536 2/20 0.39
▸ MMP1 P03956 2/20 0.39
▸ TP53 P04637 1/20 0.39
▸ CA2 P00918 3/20 0.38
▸ MMP2 P08253 1/20 0.37
▸ MMP3 P08254 1/20 0.37
▸ S1PR2 O95136 1/20 0.37
▸ S1PR1 P21453 1/20 0.37
▸ NAAA Q02083 2/20 0.36
▸ LMNA P02545 1/20 0.36
▸ CNR2 P34972 1/20 0.36
▸ SERPINE1 P05121 1/20 0.35
▸ CA1 P00915 1/20 0.35
▸ CA7 P43166 1/20 0.35
▸ CA14 Q9ULX7 1/20 0.35
▸ CACNA1F O60840 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1048442 1.00 NR1I2 (0.73) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL26646406 1.00 NR1I2 (0.73) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL19627840 1.00 NR1I2 (0.73) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL7478232 1.00 NR1I2 (0.73) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL22527421 0.98 NR1I2 (0.71) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL11504599 0.98 NR1I2 (0.71) NR1I2S1PR3MMP9MMP13ADAM17
Isopropylamine SCHEMBL30308934 0.94 NR1I2 (0.66) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL6128184 0.94 NR1I2 (0.63) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL27214770 0.94 NR1I2 (0.63) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL4310857 0.94 NR1I2 (0.63) NR1I2S1PR3MMP9MMP13ADAM17

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240209284-A1 CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT FUJIFILM CORPORATION (JP) 2024-06-27 — — US disclosed
US-20240209284-A1 CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT FUJIFILM CORPORATION (JP) 2024-06-27 — — US disclosed
US-20240067901-A1 CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT FUJIFILM CORPORATION (JP) 2024-02-29 — — US disclosed
US-20240067901-A1 CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT FUJIFILM CORPORATION (JP) 2024-02-29 — — US disclosed
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