SCHEMBL2712929

SCHEMBL2712929

OC1(Cl)C=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL27816529 0.86 FFAR3 (0.30)
Acetonitrile SCHEMBL28847279 0.86
Acetic Acid Methyl Ester SCHEMBL27816487 0.81 ALDH1A1 (0.39)
SCHEMBL5967513 0.73
SCHEMBL215660 0.73
SCHEMBL1633253 0.73
SCHEMBL10886027 0.69
SCHEMBL28899314 0.69
SCHEMBL3122909 0.69
SCHEMBL6736427 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025052516-A1 RESIN COMPOSITION, ELECTRONIC COMPONENT DEVICE, AND METHOD FOR PRODUCING RESIN COMPOSITION 株式会社レゾナック 2025-03-13 WO disclosed
WO-2025018359-A1 RESIN COMPOSITION FOR MOLDING AND ELECTRONIC COMPONENT DEVICE 株式会社レゾナック 2025-01-23 WO disclosed
CN-116986703-A Method for removing halogenated organic pollutants in water by reduction of carbon-based catalyst 华东师范大学 2023-11-03 CN disclosed
CN-115636933-A Polyaryletherketone with wide molecular weight distribution and preparation method thereof 吉林省中研高分子材料股份有限公司 2023-01-24 CN disclosed
CN-111646547-B Preparation method and application of municipal sludge derived carbon material electrode doped with iron and nitrogen 中南民族大学 2022-08-09 CN disclosed
US-20140072965-A1 1, 2-Dichloropropane-to-Propene Reductive Dehalogenase Genes UNIVERSITY OF TENNESSEE RESEARCH FOUNDATION (US) 2014-03-13 US disclosed
EP-2630086-A1 PHOTOCATALYTIC MATERIAL Oulun Yliopisto (FI) 2013-08-28 EP disclosed
US-8217031-B2 Heteroaryl derivatives NIPPON SHINYAKU CO., LTD. (JP) 2012-07-10 US disclosed
CN-101646678-B heteroaryl derivatives NIPPON SHINYAKU CO LTD 2012-05-30 CN disclosed
WO-2012052624-A1 PHOTOCATALYTIC MATERIAL OULUN YLIOPISTO (FI) 2012-04-26 WO disclosed
US-20100048537-A1 HETEROARYL DERIVATIVES NIPPON SHINYAKU CO., LTD. (JP) 2010-02-25 US disclosed
CN-101646678-A Heteroaryl Derivatives NIPPON SHINYAKU CO LTD JP 2010-02-10 CN disclosed
EP-2141168-A1 HETEROARYL DERIVATIVES Nippon Shinyaku Co., Ltd. (JP) 2010-01-06 EP disclosed
WO-1995011749-A1 PHOTOCATALYTIC DESTRUCTION OF CONTAMINANTS IN SOLIDS SCRUDATO RONALD J (US) 1995-05-04 WO disclosed
EP-0178185-B1 NOVEL AROMATIC POLYMERS RAYCHEM CORPORATION (a Delaware corporation) (US) 1991-04-10 EP disclosed
EP-0186255-A2 Process for preparing benzyl substituted phenols, dibenzylphenolic compounds, and the antioxidant use of such phenols ETHYL CORPORATION (US) 1986-07-02 EP disclosed
US-4514577-A ANTIOXIDANTS ETHYL CORPORATION (US) 1985-04-30 US disclosed