SCHEMBL27170337

SCHEMBL27170337

Cc1cc(C(C)(C)C)c(O)c(C)c1CCn1c(=O)n(CCc2c(C)cc(C(C)(C)C)c(O)c2C)c(=O)n(CCc2c(C)cc(C(C)(C)C)c(O)c2C)c1=O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 5/20 0.44
LMNA P02545 2/20 0.44
CYP3A4 P08684 2/20 0.44
HTR1A P08908 2/20 0.44
ADRA2A P08913 2/20 0.44
CYP1A2 P05177 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
CYP2D6 P10635 2/20 0.44
MEN1 O00255 1/20 0.44
CHRM2 P08172 1/20 0.44
CHRM4 P08173 1/20 0.44
CHRM5 P08912 1/20 0.44
CHRM1 P11229 1/20 0.44
TSHR P16473 1/20 0.44
ADRA2B P18089 1/20 0.44
ADRA2C P18825 1/20 0.44
ADRA1D P25100 1/20 0.44
HTR1D P28221 1/20 0.44
HTR1B P28222 1/20 0.44
HTR2A P28223 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29353077 0.85 CYP2C19 (0.46) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL26717 0.85 CYP2C19 (0.46) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL14268294 0.81 CYP2C19 (0.43) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL13302848 0.80 TSHR (0.42) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL24520502 0.80 CYP3A4 (0.42) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL14188051 0.77 CYP2C19 (0.40) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL27776681 0.76 CYP2C19 (0.49) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL10605065 0.76 CYP2C19 (0.49) CYP2C19LMNACYP3A4HTR1AADRA2A
SCHEMBL8883065 0.76 GAA (0.50) CYP2C19LMNACYP3A4CYP1A2TDP1
SCHEMBL11477730 0.76 CYP2C19 (0.46) CYP2C19LMNACYP3A4HTR1AADRA2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240085787-A1 PHOTOSENSITIVE PASTE, METHOD FOR FORMING WIRING PATTERN, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT MURATA MANUFACTURING CO., LTD. (JP) 2024-03-14 US disclosed
CN-117631452-A Photosensitive paste, wiring pattern forming method, electronic component manufacturing method, and electronic component 株式会社村田制作所 2024-03-01 CN disclosed