SCHEMBL27200580

SCHEMBL27200580

CCCCOCCOCCOC(C)=O.COCC(C)OC(C)=O

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
TSHR P16473 4/20 0.44
MAPT P10636 2/20 0.39
HSD17B10 Q99714 1/20 0.39
MEN1 O00255 1/20 0.38
HPGD P15428 1/20 0.38
KMT2A Q03164 1/20 0.38
PRKCA P17252 2/20 0.35
CYP3A4 P08684 1/20 0.35
CHRM2 P08172 1/20 0.35
CHRM4 P08173 1/20 0.35
CHRM1 P11229 1/20 0.35
TBXA2R P21731 1/20 0.35
CES2 O00748 1/20 0.34
GALR3 O60755 1/20 0.34
BLM P54132 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29283673 1.00 ALDH1A1 (0.50) ALDH1A1TSHRMAPTHSD17B10MEN1
SCHEMBL28120656 0.92 ALDH1A1 (0.44) ALDH1A1TSHRMAPTHSD17B10MEN1
Acetic Acid Butyl Ester SCHEMBL534058 0.91 ALDH1A1 (0.62) ALDH1A1TSHRMAPTHPGDPRKCA
SCHEMBL28130255 0.88 TSHR (0.52) ALDH1A1TSHRMAPTHSD17B10MEN1
SCHEMBL17222456 0.87 TSHR (0.46) ALDH1A1TSHRMAPTHSD17B10MEN1
SCHEMBL8390228 0.87 TSHR (0.56) ALDH1A1TSHRHSD17B10PRKCACHRM2
SCHEMBL19714337 0.86 TSHR (0.63) ALDH1A1TSHRMAPTHSD17B10CHRM2
SCHEMBL9067467 0.84 ALDH1A1 (0.53) ALDH1A1TSHRMAPTHSD17B10CYP3A4
SCHEMBL29101190 0.84 ALDH1A1 (0.36) ALDH1A1TSHRMAPTHSD17B10MEN1
Hexane SCHEMBL28211851 0.84 TSHR (0.44) ALDH1A1TSHRMAPTPRKCACHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4356897-A1 POWDER COSMETIC AND PRODUCTION METHOD FOR SAME Shiseido Company, Ltd. (JP) 2024-04-24 EP disclosed
CN-117716295-A Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film 日产化学株式会社 2024-03-15 CN disclosed
CN-117460995-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-26 CN disclosed