Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.47 |
| ▸ | LCK | P06239 | 1/20 | 0.47 |
| ▸ | FYN | P06241 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | RNPEP | Q9H4A4 | 1/20 | 0.38 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL15411238 | 0.90 | TP53 (0.47) | TP53TDP1TSHRALDH1A1RNPEP | |
| Acetic Acid SCHEMBL1133178 | 0.88 | RNPEP (0.46) | FFAR3LCKFYNTP53TDP1 | |
| Methacrylic Acid SCHEMBL9779496 | 0.83 | TSHR (0.38) | TP53TDP1TSHRALDH1A1RNPEP | |
| Methacrylic Acid SCHEMBL2544208 | 0.83 | TSHR (0.38) | TP53TDP1TSHRALDH1A1RNPEP | |
| SCHEMBL12559536 | 0.82 | — | — | |
| SCHEMBL37585 | 0.82 | — | — | |
| SCHEMBL42873 | 0.82 | — | — | |
| SCHEMBL840436 | 0.82 | — | — | |
| SCHEMBL42294 | 0.82 | — | — | |
| SCHEMBL524531 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 233 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12153345-B2 | Photosensitive resin composition | SUMITOMO BAKELITE CO., LTD. (JP) | 2024-11-26 | — | — | US | claimed |
| US-20240045326-A1 | PHOTOSENSITIVE RESIN COMPOSITION | SUMITOMO BAKELITE CO., LTD. (JP) | 2024-02-08 | — | — | US | claimed |
| CN-109313388-B | Negative photosensitive composition | 住友电木株式会社 | 2022-06-21 | — | — | CN | claimed |
| WO-2022118853-A1 | THERMOSETTING RESIN COMPOSITION AND SEMICONDUCTOR DEVICE | 住友ベークライト株式会社 | 2022-06-09 | — | — | WO | claimed |
| US-9176381-B2 | Positive type photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2015-11-03 | — | — | US | claimed |
| US-20150160553-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-06-11 | — | — | US | claimed |
| US-8703367-B2 | Positive photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2014-04-22 | — | — | US | claimed |
| US-8568954-B2 | Positive photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2013-10-29 | — | — | US | claimed |
| US-20110171578-A1 | Positive Photosensitive Resin Composition | CHEIL INDUSTRIES INC. (KR) | 2011-07-14 | — | — | US | claimed |
| US-20110003248-A1 | Positive photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2011-01-06 | — | — | US | claimed |
| WO-2010035925-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | CHEIL INDUSTRIES INC. (KR) | 2010-04-01 | — | — | WO | claimed |
| WO-2009116724-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | CHEIL INDUSTRIES INC. (KR) | 2009-09-24 | — | — | WO | claimed |
| US-20250138422-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2025-05-01 | — | — | US | disclosed |
| US-12153345-B2 | Photosensitive resin composition | SUMITOMO BAKELITE CO., LTD. (JP) | 2024-11-26 | — | — | US | disclosed |
| US-20240321803-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| US-20240272551-A1 | NEGATIVE-TYPE PHOTOSENSITIVE POLYMER, POLYMER SOLUTION, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2024-08-15 | — | — | US | disclosed |
| US-6048924-A | AMINO RESIN FROM CARBOXY AMINO COMPOUND BENZOGUANIMINE | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2000-04-11 | — | — | US | disclosed |
| EP-0990673-A2 | Polybenzoxazole resin and precursor thereof | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2000-04-05 | — | — | EP | disclosed |
| EP-0860473-A1 | AQUEOUS RESIN COMPOSITION AND AQUEOUS PAINT | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1998-08-26 | — | — | EP | disclosed |
| EP-0807852-A1 | Positive type photosensitive resin composition and semiconductor device using the same | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1997-11-19 | — | — | EP | disclosed |