SCHEMBL27269482

SCHEMBL27269482

[CH2]CC=CCCCC=CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22553082 0.94 FAAH (0.32)
SCHEMBL22553081 0.94 FAAH (0.32)
SCHEMBL2140815 0.94 FAAH (0.32)
SCHEMBL23493105 0.92 FAAH (0.36)
SCHEMBL25185542 0.92 FAAH (0.36)
SCHEMBL25181763 0.92 FAAH (0.36)
SCHEMBL23493104 0.92 FAAH (0.36)
SCHEMBL25181802 0.92 FAAH (0.36)
SCHEMBL29284436 0.92 FAAH (0.36)
SCHEMBL7294431 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109476141-A Encapsulant film, the multilayer film including the encapsulant film and packaging bag 凸版印刷株式会社 2019-03-15 CN claimed
CN-1048657-C Catalyst for preparing alcohol by olefin hydroformylation LANZHOU CHEM PHYS INST (CN) 2000-01-26 CN claimed
CN-1126108-A Catalyst or prepn. of alcohol by hydrogen formylation of olefines LANZHOU CHEM PHYS INST (CN) 1996-07-10 CN claimed
CN-116323733-A Ester compound and resin composition 味之素株式会社 2023-06-23 CN disclosed
CN-116323746-A Ester compound and resin composition 味之素株式会社 2023-06-23 CN disclosed
CN-106062631-B Radiation sensitive resin composition and electronic component 日本瑞翁株式会社 2019-11-22 CN disclosed
CN-105474096-B Radiation-sensitive resin composition, resin film, and electronic component 日本瑞翁株式会社 2019-11-12 CN disclosed
CN-110431105-A Method for manufacturing micro-channel chip ZEON CORP 2019-11-08 CN disclosed
CN-106164773-B Radiation sensitive resin composition, resin film and electronic component ZEON CORP. (JP) 2019-11-01 CN disclosed
CN-110366704-A Radiation sensitive resin composition and electronic component 日本瑞翁株式会社 2019-10-22 CN disclosed
CN-104969125-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社 2019-06-04 CN disclosed
CN-106164773-A Radiation sensitive resin composition, resin molding and electronic unit 日本瑞翁株式会社 2016-11-23 CN disclosed
CN-106104380-A Radiation sensitive resin composition and electronic unit 日本瑞翁株式会社 2016-11-09 CN disclosed
CN-106062631-A Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社 2016-10-26 CN disclosed
CN-105993065-A Semiconductor element manufacturing method 国立大学法人东北大学 2016-10-05 CN disclosed
CN-104508521-B Polarizer and liquid crystal indicator 富士胶片株式会社 2016-08-03 CN disclosed
CN-1048657-C Catalyst for preparing alcohol by olefin hydroformylation LANZHOU CHEM PHYS INST (CN) 2000-01-26 CN disclosed
CN-1126108-A Catalyst or prepn. of alcohol by hydrogen formylation of olefines LANZHOU CHEM PHYS INST (CN) 1996-07-10 CN disclosed
CN-1020680-C CATALYST FOR PREPARING ALCOHOL FROM OLEFIN LANZHOU INST OF CHEMISTRY AND (CN) 1993-05-19 CN disclosed
CN-1043640-A CATALYST FOR PREPARING ALCOHOL FROM OLEFIN LANZHOU INST OF CHEMISTRY AND (CN) 1990-07-11 CN disclosed