⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrazine SCHEMBL10349266 | 0.96 | — | — | |
| SCHEMBL6131270 | 0.96 | — | — | |
| SCHEMBL4273744 | 0.96 | — | — | |
| Ammonia Solution, Strong SCHEMBL11555731 | 0.96 | — | — | |
| SCHEMBL15224248 | 0.85 | CA5A (0.30) | — | |
| SCHEMBL28024878 | 0.83 | — | — | |
| Thiosulfuric Acid SCHEMBL9820341 | 0.83 | MEN1 (0.33) | — | |
| Thiourea SCHEMBL29287642 | 0.80 | TSHR (0.50) | — | |
| Thiourea SCHEMBL10393716 | 0.77 | — | — | |
| Thiourea SCHEMBL22608863 | 0.77 | TSHR (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 8204 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122079871-A | Preparation method of aryl substituted alcohol | — | 2026-05-26 | — | — | CN | claimed |
| CN-122061359-A | Double pH value alkali gradient utilization low-salt environment-friendly dyeing and finishing process | 吕文祥 | 2026-05-19 | — | — | CN | claimed |
| CN-121021404-B | Synthesis process of high-purity sulfachloropyridazine sodium | 寿光富康制药有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-122011240-A | Mixed regulation type chloroprene rubber and synthesis process thereof | 重庆瑞淼工程技术咨询有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-122028536-A | Preparation method of thiourea dioxide-nano selenium sol anion source precursor solution | 电子科技大学中山学院 | 2026-05-12 | — | — | CN | claimed |
| CN-118530642-B | Waterproof agent for edge sealing of wooden floor, preparation and application | 北京盛大华源科技有限公司 | 2026-02-27 | — | — | CN | claimed |
| CN-121574601-A | Environment-friendly release agent and preparation method and application thereof | 肇庆市联力化工有限公司 | 2026-02-27 | — | — | CN | claimed |
| CN-121574310-A | Carboxyl polyisoprene latex and preparation method and application thereof | 濮阳乐享化科新材料有限公司 | 2026-02-27 | — | — | CN | claimed |
| EP-4692075-A1 | USE OF A MECHANICAL FORCE IN THE PROCESS OF PREPARATION OF OSIMERTINIB | Université de Montpellier (FR) | 2026-02-11 | — | — | EP | claimed |
| US-20260015377-A1 | CRYSTALLINE FORM I OF REDUCED NICOTINAMIDE MONONUCLEOTIDE DISODIUM MONOHYDRATE AND PREPARATION METHOD THEREFOR | Greenanew (Shanghai) Biotech Co., Ltd. (CN) | 2026-01-15 | — | — | US | claimed |
| US-4197256-A | KETONES OR DIALDEHYDES AS STABILIZERS | TOKAI DENKA KOGYO KABUSHIKI KAISHA (JP) | 1980-04-08 | — | — | US | claimed |
| US-4177071-A | HIGH SENSITIVITY TO PENTRATING RADIATION; INSENSITIVE TO FORMATION OF PRESSURE MARKS | AGFA-GEVAERT, N.V. (BE) | 1979-12-04 | — | — | US | claimed |
| US-4174968-A | Photographic reversal process without second exposure | AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) | 1979-11-20 | — | — | US | claimed |
| US-RE29930-E | HIGH SPEED | EASTMAN KODAK COMPANY (US) | 1979-03-13 | — | — | US | claimed |
| US-RE29575-E | Cubic regular grain photographic reversal emulsions | EASTMAN KODAK COMPANY (US) | 1978-03-14 | — | — | US | claimed |
| US-4059450-A | Direct positive silver halide elements | AGFA-GEVAERT N.V. (BE) | 1977-11-22 | — | — | US | claimed |
| US-4045228-A | Direct positive emulsions containing fogged, monodispersed silver halide grains having more than 10 mile % iodide | AGFA-GEVAERT N.V. (BE) | 1977-08-30 | — | — | US | claimed |
| US-3988108-A | COLORING AGENT, SYNTHETIC RESIN PREPOLYMER OR PRECONDENSATE; HEAT TREATMENT, REDUCTIONCHEMICAL | KANEBO, LTD. (JA) | 1976-10-26 | — | — | US | claimed |
| US-3970459-A | Process for developing a direct reversal silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JA) | 1976-07-20 | — | — | US | claimed |
| US-3934004-A | Stain resistant anti-perspirant composition | ORREN LEONARD J | 1976-01-20 | — | — | US | claimed |