SCHEMBL2728130

SCHEMBL2728130

COC(=O)c1cc(O)c(OC)c(O)c1

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.72
LMNA P02545 3/20 0.72
XDH P47989 2/20 0.72
TDP1 Q9NUW8 2/20 0.72
POLB P06746 1/20 0.72
GAA P10253 1/20 0.72
NFKB1 P19838 1/20 0.72
GFER P55789 1/20 0.72
NFKB2 Q00653 1/20 0.72
RELA Q04206 1/20 0.72
FUT7 Q11130 1/20 0.72
L3MBTL1 Q9Y468 1/20 0.72
CA1 P00915 4/20 0.61
CA2 P00918 4/20 0.61
CA12 O43570 3/20 0.61
CA7 P43166 3/20 0.61
CA9 Q16790 3/20 0.61
CA14 Q9ULX7 3/20 0.61
CNR2 P34972 2/20 0.56
ALDH1A1 P00352 2/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1134668 0.88 TPMT (0.73) KDM4ELMNAXDHTDP1POLB
SCHEMBL27898473 0.88 LMNA (0.62) KDM4ELMNAXDHTDP1POLB
SCHEMBL1056601 0.86 LMNA (0.66) KDM4ELMNAXDHTDP1POLB
Gallic Acid Methyl Ester SCHEMBL39513 0.84 KDM4E (1.00) KDM4ELMNAXDHTDP1POLB
SCHEMBL16503507 0.83 KDM4E (0.67) KDM4ELMNAXDHTDP1POLB
SCHEMBL8357710 0.82 CA12 (0.61) KDM4ELMNAXDHTDP1POLB
Gallic Acid Methyl Ester SCHEMBL21611341 0.82 KDM4E (0.95) KDM4ELMNAXDHTDP1POLB
Gallic Acid Methyl Ester SCHEMBL21543905 0.82 KDM4E (0.95) KDM4ELMNAXDHTDP1POLB
SCHEMBL1919075 0.82 KDM4E (0.72) KDM4ELMNAXDHTDP1POLB
Gallic Acid Methyl Ester SCHEMBL28556619 0.82 KDM4E (0.95) KDM4ELMNAXDHTDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130310332-A1 MAPLE TREE-DERIVED PRODUCTS AND USES THEREOF UNIVERSITY OF RHODE ISLAND (US) 2013-11-21 US claimed
WO-2012055010-A1 MAPLE TREE-DERIVED PRODUCTS AND USES THEREOF FÉDÉRATION DES PRODUCTEURS ACÉRICOLES DU QUÉBEC (CA) 2012-05-03 WO claimed
EP-0239423-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-09-30 EP claimed
US-20250223462-A1 ELECTRONIC COMPONENT NIHON PARKERIZING CO., LTD. (JP) 2025-07-10 US disclosed
CN-119013434-A Electronic component 日本帕卡濑精株式会社 2024-11-22 CN disclosed
WO-2024189607-A1 METHODS AND BIOAVAILABLE HIGHLY PERMEABLE COMPOUNDS FOR DISEASES TREATMENT DIDENKO KIRILL (MX) 2024-09-19 WO disclosed
WO-2023235464-A1 NOVEL EQUILIBRATIVE NUCLEOSIDE TRANSPORTER INHIBITORS AND METHODS OF MAKING AND USING SAME DUKE UNIVERSITY (US) 2023-12-07 WO disclosed
WO-2023195439-A1 ELECTRONIC COMPONENT 日本パーカライジング株式会社 2023-10-12 WO disclosed
US-11339179-B2 Preparation for natural product trabectedin CE PHARM CO., LTD. (CN) 2022-05-24 US disclosed
US-20210171883-A1 ANTIVIRAL WIPER FUJIFILM CORPORATION (JP) 2021-06-10 US disclosed
US-20210163500-A1 PREPARATION FOR NATURAL PRODUCT TRABECTEDIN CE PHARM CO., LTD. (CN) 2021-06-03 US disclosed
US-20030027814-A1 Bis(5-aryl-2-pyridyl) derivatives KOWA CO., LTD. (JP) 2003-02-06 US disclosed
US-5635329-A QUINONEDIAZIDE, SOLVENT AND SPECIFIC ALKALI-SOLUBLE NOVOLAK RESINS MITSUBISHI CHEMICAL CORPORATION (JP) 1997-06-03 US disclosed
EP-0239423-B1 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-03-20 EP disclosed
US-5447825-A Photoresists, patterns on semiconductors, phenolic resin, quinonediazide MITSUBISHI CHEMICAL CORPORATION (JP) 1995-09-05 US disclosed
EP-0660186-A1 Photosensitive resin composition and method for forming a pattern using the composition Mitsubishi Chemical Corporation (JP) 1995-06-28 EP disclosed
US-5372909-A High resolution level, large exposure margin; photoresists MITSUBISHI KASEI CORPORATION (JP) 1994-12-13 US disclosed
US-5019479-A Photoresists for integrated circuits JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-28 US disclosed
EP-0239423-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-09-30 EP disclosed
US-4009208-A N,N'-HEPTAMETHYLENEBIS(4-METHOXYBENZAMIDE) STERLING DRUG INC. (US) 1977-02-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210163500-A1 PREPARATION FOR NATURAL PRODUCT TRABECTEDIN TH, TYR, FLT4 KDM4E 791/4885LMNA 3249/4885XDH 956/4885
US-20210171883-A1 ANTIVIRAL WIPER CGAS, PRKX, PDE4C KDM4E 523/4885LMNA 1615/4885XDH 169/4885
US-20030027814-A1 Bis(5-aryl-2-pyridyl) derivatives AHR, PAH, H1-0 KDM4E 1363/4885LMNA 1526/4885XDH 51/4885
US-11339179-B2 Preparation for natural product trabectedin TH, TYR, FLT4 KDM4E 791/4885LMNA 3249/4885XDH 956/4885
US-20130310332-A1 MAPLE TREE-DERIVED PRODUCTS AND USES THEREOF FASN, NNT, MAPK7 KDM4E 4065/4885LMNA 623/4885XDH 2582/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.