Methacrylic Acid

Methacrylic Acid

SCHEMBL2728491

C1CCOC1.C1CCOC1.C=C(C)C(=O)O

nearest known ligand 0.42

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Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
SMN1; SMN2 Q16637 1/20 0.36
TDP1 Q9NUW8 1/20 0.35
POLB P06746 1/20 0.32
RECQL P46063 1/20 0.32
BLM P54132 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
GLA P06280 1/20 0.31
MEN1 O00255 1/20 0.30
TP53 P04637 1/20 0.30
KMT2A Q03164 1/20 0.30
FFAR3 O14843 1/20 0.30
LCK P06239 1/20 0.30
FYN P06241 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6781050 1.00 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL491347 1.00 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL3212043 1.00 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL28150743 0.97 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL2576711 0.97 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL5664711 0.97 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL2261356 0.97 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL5665123 0.95 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL775263 0.89 TDP1 (0.38) ALDH1A1SMN1; SMN2TDP1POLBRECQL
Methacrylic Acid SCHEMBL8985959 0.89 SMN1; SMN2 (0.44) ALDH1A1SMN1; SMN2TDP1POLBRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1637928-B1 Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same DONGJIN SEMICHEM CO LTD (KR) 2012-05-02 EP disclosed