SCHEMBL2729318

SCHEMBL2729318

O=C(c1ccccc1)[P](=O)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.46
CES2 O00748 5/20 0.46
TSHR P16473 3/20 0.46
ALDH1A1 P00352 3/20 0.46
DAO P14920 1/20 0.46
NAPRT Q6XQN6 1/20 0.46
TDP1 Q9NUW8 4/20 0.42
CYP3A4 P08684 2/20 0.42
MAPT P10636 2/20 0.42
CA2 P00918 2/20 0.42
CA4 P22748 2/20 0.42
HSD17B10 Q99714 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
CA12 O43570 2/20 0.42
CA1 P00915 2/20 0.42
CA9 Q16790 2/20 0.42
POLB P06746 1/20 0.42
PARP1 P09874 1/20 0.42
CYP2C19 P33261 1/20 0.42
RECQL P46063 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28651214 0.86 CES2 (0.53) CES1CES2ALDH1A1TDP1MAPT
SCHEMBL5164356 0.78 CES1 (0.48) CES1CES2TSHRALDH1A1DAO
SCHEMBL1608946 0.78 CES1 (0.48) CES1CES2TSHRALDH1A1DAO
SCHEMBL543379 0.77 CES1 (0.52) CES1CES2TSHRALDH1A1DAO
Water SCHEMBL28310706 0.76 CES1 (0.46) CES1CES2TSHRALDH1A1DAO
Water SCHEMBL28312324 0.76 CES1 (0.46) CES1CES2TSHRALDH1A1DAO
Hydrochloric Acid SCHEMBL27459744 0.76 CES1 (0.46) CES1CES2TSHRALDH1A1DAO
SCHEMBL14497200 0.74 CES1 (0.44) CES1CES2TSHRALDH1A1DAO
SCHEMBL1346680 0.74 CES1 (0.55) CES1CES2TSHRALDH1A1DAO
SCHEMBL18204065 0.73 CES2 (0.46) CES1CES2TSHRALDH1A1DAO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110202897-A Automatically cleaning flexible compound structure writing carrier 江苏斯迪克新材料科技股份有限公司 2019-09-06 CN claimed
CN-106547039-B A kind of preparation method of SiC photonic crystal 西安铂力特增材技术股份有限公司 2019-07-23 CN claimed
CN-109735288-A Bionic sweat-resistant photocuring coating adhesive and preparation method thereof 烟台德邦科技有限公司 2019-05-10 CN claimed
CN-109535334-A One kind is for quickly molding photosensitive resin of continuous liquid level and preparation method thereof 西安点云生物科技有限公司 2019-03-29 CN claimed
CN-108912756-A A kind of aluminum ceiling coating and preparation method thereof 广州市精合致新材料科技有限公司 2018-11-30 CN claimed
CN-107880223-A A kind of 3D printing resin of novel fast curing, low-shrinkage 杭州维彬科技有限公司 2018-04-06 CN claimed
CN-107573820-A A kind of net taste UV dumb light woodcare paints of special texture super abrasive and preparation method and application 北京展辰新材料有限公司 2018-01-12 CN claimed
CN-105348322-B A kind of phenyl is double(2,4,6 trimethylbenzoyls)The preparation method of phosphine oxide 山东久日化学科技有限公司 2017-08-25 CN claimed
CN-106547039-A A kind of preparation method of SiC photonic crystals 西安铂力特激光成形技术有限公司 2017-03-29 CN claimed
CN-106047137-A Anti-sticking UV gloss oil and preparation method thereof 山东力美喷墨科技有限公司 2016-10-26 CN claimed
CN-101728156-B Electrode slurry for plasma display and application thereof SICHUAN COC DISPLAY DEVICES CO 2012-02-29 CN claimed
CN-101728148-B Electrode paste, electrode made from same, manufacturing methods thereof and PDP display screen provided with electrode SICHUAN COC DISPLAY DEVICES CO 2011-09-14 CN claimed
CN-101987933-A UV (Ultra Violet) offset printing ink and preparation method thereof SHENZHEN SHENSAIER IND CO LTD 2011-03-23 CN claimed
CN-101728148-A Electrode paste, electrode made from same, manufacturing methods thereof and PDP display screen provided with electrode SICHUAN COC DISPLAY DEVICES CO 2010-06-09 CN claimed
CN-101728156-A Electrode slurry for plasma display and application thereof SICHUAN COC DISPLAY DEVICES CO 2010-06-09 CN claimed
CN-101665559-A Modified photo-hardening resin composition for high-wear-resistance/high-toughness/high-hardness nanometer materials NANTONG MEMTECH ELECTRONIC IND 2010-03-10 CN claimed
CN-100480344-C UV offset transparent printing ink, and preparation method thereof SHENZHEN SHENSAIER IND CO LTD (CN) 2009-04-22 CN claimed
US-7345097-B2 Autoxidisable architectural coating compositions IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 2008-03-18 US claimed
CN-101003705-A UV offset transparent printing ink, and preparation method SHENSAIER IND CO LTD SHENZHEN (CN) 2007-07-25 CN claimed
CN-1749855-A Light solidified barrier size for producing gas discharging display screen CAIHONG GROUP ELECT CO LTD (CN) 2006-03-22 CN claimed