Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.90 |
| ▸ | MEN1 | O00255 | 4/20 | 0.70 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.70 |
| ▸ | THRB | P10828 | 1/20 | 0.70 |
| ▸ | HTT | P42858 | 1/20 | 0.70 |
| ▸ | MAPT | P10636 | 1/20 | 0.70 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | USP2 | O75604 | 2/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.44 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butoxyethanol SCHEMBL1818617 | 1.00 | TSHR (0.90) | TSHRMEN1KMT2ATHRBHTT | |
| Butoxyethanol SCHEMBL3422979 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| SCHEMBL11879795 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| Di(Hydroxyethyl)Ether SCHEMBL28057496 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| Tetraethylene Glycol SCHEMBL23356855 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| SCHEMBL23211215 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| Pentaethylene Glycol SCHEMBL28531451 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| Triethylene Glycol SCHEMBL23356964 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| Hexaethylene Glycol SCHEMBL28909307 | 0.97 | TSHR (0.85) | TSHRMEN1KMT2ATHRBHTT | |
| Butoxyethanol SCHEMBL8101108 | 0.95 | TSHR (1.00) | TSHRMEN1KMT2ATHRBHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12633572-B2 | Electrolytic solution and electrochemical device | MURATA MANUFACTURING CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12597635-B2 | Electrochemical device | MURATA MANUFACTURING CO., LTD. (JP) | 2026-04-07 | — | — | US | disclosed |
| EP-4697403-A1 | NEGATIVE-ELECTRODE ENHANCEMENT FILM FOR SECONDARY BATTERY, AND SECONDARY BATTERY AND ELECTRIC APPARATUS | Zhejiang Shengxing Technology Co., Ltd (CN) | 2026-02-18 | — | — | EP | disclosed |
| EP-4697415-A1 | SECONDARY BATTERY AND ELECTRIC APPARATUS | Zhejiang Shengxing Technology Co., Ltd (CN) | 2026-02-18 | — | — | EP | disclosed |
| CN-116891654-B | Inkjet ink composition and recording method | 精工爱普生株式会社 | 2024-11-08 | — | — | CN | disclosed |
| US-12095081-B2 | Electrolytic solution and electrochemical device | MURATA MANUFACTURING CO., LTD. (JP) | 2024-09-17 | — | — | US | disclosed |
| EP-3689936-B1 | BLOCKED POLYISOCYANATE COMPOSITION AND USE THEREOF | ASAHI CHEMICAL IND (JP) | 2024-03-06 | — | — | EP | disclosed |
| US-20240014378-A1 | POSITIVE ELECTRODE AND ELECTROCHEMICAL DEVICE | MURATA MANUFACTURING CO., LTD. (JP) | 2024-01-11 | — | — | US | disclosed |
| US-20230395862-A1 | ELECTROLYTE SOLUTION, PRODUCTION METHOD THEREFOR, AND SECONDARY BATTERY | MURATA MANUFACTURING CO., LTD. (JP) | 2023-12-07 | — | — | US | disclosed |
| CN-112823184-B | Method for producing transparent polyimide film | 株式会社钟化 | 2023-11-07 | — | — | CN | disclosed |
| US-20070254221-A1 | Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. | SAMSUNG DISPLAY CO., LTD. (KR) | 2007-11-01 | — | — | US | disclosed |
| US-20060141393-A1 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. | 2006-06-29 | — | — | US | disclosed |
| US-20060131267-A1 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG DISPLAY CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |
| EP-0464652-B1 | Agent and method for removing rosin-base solder flux | ARAKAWA CHEM IND (JP) | 1995-09-20 | — | — | EP | disclosed |
| US-5330582-A | Using mixture og glycol ether and nonionic surfactants | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 1994-07-19 | — | — | US | disclosed |
| US-5256209-A | Using mixture of glycol ether, nonionic surfactant, anionic phosphate surfactant | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 1993-10-26 | — | — | US | disclosed |
| EP-0426943-B1 | AGENT AND METHOD FOR REMOVING ROSINBASE SOLDER FLUX | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 1993-09-15 | — | — | EP | disclosed |
| EP-0464652-A1 | Agent and method for removing rosin-base solder flux | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 1992-01-08 | — | — | EP | disclosed |
| EP-0426943-A2 | Agent and method for removing rosinbase solder flux | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 1991-05-15 | — | — | EP | disclosed |
| US-4176132-A | Reaction of organic diisocyanates with water | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1979-11-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12633572-B2 | Electrolytic solution and electrochemical device | KCNN1, HCN4, KCNN2 | TSHR 312/4885MEN1 801/4885KMT2A 916/4885 |
| US-12597635-B2 | Electrochemical device | CLCN2, HCN4, SLC26A3 | TSHR 1300/4885MEN1 1871/4885KMT2A 2323/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.