⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL500658 | 0.98 | — | — | |
| SCHEMBL5888969 | 0.78 | — | — | |
| Sulfuric Acid SCHEMBL28426100 | 0.77 | — | — | |
| SCHEMBL7788261 | 0.74 | — | — | |
| SCHEMBL10696325 | 0.73 | LMNA (0.31) | — | |
| SCHEMBL3692897 | 0.73 | — | — | |
| SCHEMBL917587 | 0.73 | LMNA (0.31) | — | |
| SCHEMBL28940316 | 0.72 | — | — | |
| Sulfuric Acid SCHEMBL14837002 | 0.71 | — | — | |
| SCHEMBL3468811 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1918698-B | Cleaning liquid and cleaning method for substrate for semiconductor device | MITSUBISHI CHEM CORP | 2010-04-07 | — | — | CN | claimed |
| CN-100439426-C | Nontacky latex products | SUZUKI LATEX INDUSTRY CO LTD (JP) | 2008-12-03 | — | — | CN | claimed |
| CN-1918698-A | Cleaning liquid and cleaning method for substrate for semiconductor device | MITSUBISHI CHEM CORP (JP) | 2007-02-21 | — | — | CN | claimed |
| EP-4328290-A1 | PRODUCTION METHOD FOR SOAP COMPOSITION CONTAINING SODIUM OF HIGHER FATTY ACID AND POTASSIUM OF HIGHER FATTY ACID | SPH Corporation (JP) | 2024-02-28 | — | — | EP | disclosed |
| US-20240026254-A1 | CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230145012-A1 | CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2023-05-11 | — | — | US | disclosed |
| US-20230099612-A1 | TREATMENT LIQUID, CHEMICAL MECHANICAL POLISHING METHOD, AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| US-20230088854-A1 | CLEANING LIQUID AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2023-03-23 | — | — | US | disclosed |
| US-20230065213-A1 | CLEANING FLUID AND CLEANING METHOD | FUJIFILM CORPORATION (JP) | 2023-03-02 | — | — | US | disclosed |
| US-20220177814-A1 | CLEANING SOLUTION AND CLEANING METHOD | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-20210395645-A1 | CLEANING LIQUID | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-12-23 | — | — | US | disclosed |
| CN-1261779-A | Skin care compositions | PROCTER & GAMBLE (US) | 2000-08-02 | — | — | CN | disclosed |
| CN-1261780-A | Skin care compositions comprising vitamin B3 and preservative | PROCTER & GAMBLE (US) | 2000-08-02 | — | — | CN | disclosed |
| CN-1175962-A | Process for preparing water-absorbent resin | SUMITOMO SEIKA CHEMICALS (JP) | 1998-03-11 | — | — | CN | disclosed |
| CN-1155439-A | Disposable absorbing article for body fluid | UNI CHARM CORP (JP) | 1997-07-30 | — | — | CN | disclosed |
| CN-1111983-A | Antiperspirant deodorant compositions | CURTIS HELENE IND INC (US) | 1995-11-22 | — | — | CN | disclosed |
| CN-1112119-A | 13-substituted milbemycin derivatives, their preparation and use | SANKYO CO (JP) | 1995-11-22 | — | — | CN | disclosed |
| CN-1023486-C | PROCESS FOR PRODUCTION OF WATER-ABSORBENT RESIN | SEITETSU KAGAKU CO LTD (JP) | 1994-01-12 | — | — | CN | disclosed |
| CN-1053796-A | Produce the method for absorbent resin | SEITETSU KAGAKU CO LTD (JP) | 1991-08-14 | — | — | CN | disclosed |
| US-4894324-A | WATER SOLUBLE SULFATES OF HETEROCYCLIC SULFATES | AGFA-GEVAERT AKTIENGESSELLSCHAFT (DE) | 1990-01-16 | — | — | US | disclosed |