⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1402767 | 0.76 | — | — | |
| SCHEMBL1402793 | 0.71 | — | — | |
| SCHEMBL573260 | 0.68 | — | — | |
| SCHEMBL1024951 | 0.68 | — | — | |
| SCHEMBL1402721 | 0.67 | — | — | |
| SCHEMBL1402483 | 0.67 | TSHR (0.39) | — | |
| SCHEMBL1402726 | 0.67 | TSHR (0.44) | — | |
| SCHEMBL30158456 | 0.67 | — | — | |
| SCHEMBL216984 | 0.67 | TSHR (0.50) | — | |
| SCHEMBL27051341 | 0.65 | TSHR (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8431330-B2 | Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent | FUJIFILM CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8431330-B2 | Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent | FUJIFILM CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20120076991-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120076991-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-8088566-B2 | Photoresists; using compound containing an orgaooxygen or organosulfur compound | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8088566-B2 | Photoresists; using compound containing an orgaooxygen or organosulfur compound | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20080241742-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241742-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| EP-1975718-A2 | Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent | FUJIFILM Corporation (JP) | 2008-10-01 | — | — | EP | disclosed |