⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12259584 | 0.87 | — | — | |
| SCHEMBL9908427 | 0.78 | — | — | |
| SCHEMBL13992877 | 0.73 | — | — | |
| SCHEMBL14330304 | 0.72 | — | — | |
| SCHEMBL14625815 | 0.72 | — | — | |
| SCHEMBL10115217 | 0.71 | — | — | |
| SCHEMBL9908397 | 0.71 | MEN1 (0.32) | — | |
| SCHEMBL576482 | 0.68 | — | — | |
| SCHEMBL20715353 | 0.68 | — | — | |
| SCHEMBL29152239 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8431330-B2 | Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent | FUJIFILM CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20120076991-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-8088566-B2 | Photoresists; using compound containing an orgaooxygen or organosulfur compound | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20100183978-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100028803-A1 | SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSITION, METHOD OF TREATING SURFACE OF RESIST PATTERN THEREWITH AND METHOD OF FORMING RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20090280440-A1 | SURFACE TREATING AGENT FOR RESIST-PATTERN, AND PATTERN-FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2009-11-12 | — | — | US | disclosed |
| US-20080241742-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |