⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27488037 | 0.77 | — | — | |
| SCHEMBL27678584 | 0.74 | KDM4E (0.30) | — | |
| SCHEMBL27820000 | 0.74 | — | — | |
| SCHEMBL27298911 | 0.74 | — | — | |
| SCHEMBL20111149 | 0.74 | — | — | |
| SCHEMBL23505917 | 0.72 | — | — | |
| Methane SCHEMBL28032954 | 0.71 | — | — | |
| SCHEMBL28787170 | 0.70 | — | — | |
| SCHEMBL17146931 | 0.70 | — | — | |
| SCHEMBL11591146 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105764885-B | The production method of acid and free-radical generating agent and acid and free radical | 富士胶片和光纯药株式会社 | 2018-11-09 | — | — | CN | disclosed |
| CN-1404496-B | Organic polymer and novel polymerizable compound | MITSUI CHEMICALS INC | 2013-07-17 | — | — | CN | disclosed |
| CN-1781914-B | Organic polymer and novel polymerizable compound | MITSU CHEMICALS INC | 2012-08-15 | — | — | CN | disclosed |
| CN-102417560-A | Multistage emulsion polymer and improved pigment efficiency | ROHM & HAAS | 2012-04-18 | — | — | CN | disclosed |
| CN-102417776-A | Stable aqueous composite compositions | ROHM & HAAS | 2012-04-18 | — | — | CN | disclosed |
| CN-102122114-A | Process for producing photoresist pattern | SUMITOMO CHEMICAL CO | 2011-07-13 | — | — | CN | disclosed |
| CN-102043331-A | Process for producing photoresist pattern | SUMITOMO CHEMICAL CO | 2011-05-04 | — | — | CN | disclosed |
| CN-1847320-B | Aqueous polymer dispersions | ROHM & HAAS | 2010-06-23 | — | — | CN | disclosed |
| CN-100540601-C | Aqueous polymer dispersion with high content unsaturated flow promoter content | ROHM & HAAS (US) | 2009-09-16 | — | — | CN | disclosed |
| CN-100509979-C | Polymer composition and monomeric composition preparied using the same | ROHM & HAAS (US) | 2009-07-08 | — | — | CN | disclosed |
| CN-1521216-A | Aqueous composition and method of preparing nonyellowing coating therefrom | 罗姆和哈斯公司 | 2004-08-18 | — | — | CN | disclosed |
| CN-1497028-A | Coating preparation containing polymer nanoparticle and biological active material | 罗姆和哈斯公司 | 2004-05-19 | — | — | CN | disclosed |
| CN-1497019-A | Polymer nanoparticle formula and its application of improved anti-dust on coating | ��������ķ������ | 2004-05-19 | — | — | CN | disclosed |
| CN-1493636-A | Water based adhesive | ��������ķ������ | 2004-05-05 | — | — | CN | disclosed |
| CN-1482160-A | Curable fluids for forming coatings and adhesives | ��������ķ������ | 2004-03-17 | — | — | CN | disclosed |
| CN-1450114-A | Aqueous polymer blend composition | ROHM & HAAS (US) | 2003-10-22 | — | — | CN | disclosed |
| CN-1443819-A | Polymer composition and monomeric composition preparied using the same | ROHM & HAAS (US) | 2003-09-24 | — | — | CN | disclosed |
| CN-1404496-A | Organic polymer and novel polymerizable compound | MITSUI CHEMICALS INC (JP) | 2003-03-19 | — | — | CN | disclosed |
| CN-1052013-C | Carrier for biocatalyst immobilization use, immobilized biocatalyst, and method for immobilizing biocatalyst | MITSUBISHI RAYON CO (JP) | 2000-05-03 | — | — | CN | disclosed |
| CN-1112583-A | Carrier for biocatalyst immobilization use, immobilized biocatalyst, and method for immobilizing biocatalyst | NITTO CHEMICAL INDUSTRY CO LTD (JP) | 1995-11-29 | — | — | CN | disclosed |