⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17146931 | 1.00 | — | — | |
| SCHEMBL23505917 | 0.81 | — | — | |
| SCHEMBL27572448 | 0.80 | — | — | |
| SCHEMBL1574215 | 0.78 | TDP1 (0.32) | — | |
| SCHEMBL26907584 | 0.78 | — | — | |
| SCHEMBL27719247 | 0.78 | — | — | |
| SCHEMBL27891465 | 0.76 | — | — | |
| SCHEMBL27579929 | 0.75 | — | — | |
| SCHEMBL28091562 | 0.75 | ALDH1A1 (0.37) | — | |
| SCHEMBL15830254 | 0.73 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102122114-A | Process for producing photoresist pattern | SUMITOMO CHEMICAL CO | 2011-07-13 | — | — | CN | disclosed |
| CN-102043331-A | Process for producing photoresist pattern | SUMITOMO CHEMICAL CO | 2011-05-04 | — | — | CN | disclosed |