Styrene

Styrene

SCHEMBL273537

C=CC(=O)O.C=COC(C)=O.C=Cc1ccccc1

nearest known ligand 0.48

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
TSHR P16473 2/20 0.48
TDP1 Q9NUW8 2/20 0.39
AKR1C3 P42330 1/20 0.39
GLA P06280 1/20 0.39
AKT1 P31749 1/20 0.37
HDAC3 O15379 1/20 0.37
TNKS O95271 1/20 0.37
HDAC4 P56524 1/20 0.37
HDAC1 Q13547 1/20 0.37
HCAR2 Q8TDS4 1/20 0.37
HDAC7 Q8WUI4 1/20 0.37
HDAC2 Q92769 1/20 0.37
HDAC10 Q969S8 1/20 0.37
HDAC11 Q96DB2 1/20 0.37
HDAC8 Q9BY41 1/20 0.37
TNKS2 Q9H2K2 1/20 0.37
HDAC6 Q9UBN7 1/20 0.37
HDAC9 Q9UKV0 1/20 0.37
HDAC5 Q9UQL6 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL381689 0.95 ALDH1A1 (0.54) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL28187565 0.95 ALDH1A1 (0.54) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL9640408 0.95 ALDH1A1 (0.54) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL28467144 0.93 ALDH1A1 (0.48) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL10608565 0.93 ALDH1A1 (0.52) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL21448340 0.93 ALDH1A1 (0.52) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL4162964 0.92 ALDH1A1 (0.47) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL27848641 0.92 ALDH1A1 (0.47) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL8098448 0.91 ALDH1A1 (0.50) ALDH1A1TSHRTDP1AKR1C3GLA
Styrene SCHEMBL23462407 0.90 ALDH1A1 (0.48) ALDH1A1TSHRTDP1AKR1C3GLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8133314-B2 Ink composition, recording method using the same, and recorded matter SEIKO EPSON CORPORATION (JP) 2012-03-13 US disclosed
US-20100247874-A1 INK COMPOSITION, RECORDING METHOD USING THE SAME, AND RECORDED MATTER SEIKO EPSON CORPORATION 2010-09-30 US disclosed
CN-1063288-A Quaternary phenylpropyl water-soluble emulsion and synthetic method BUILDING MATERIAL INDUSTRY DES (CN) 1992-08-05 CN disclosed
CN-87100921-A ACRYLIC ESTER-STYRENE-VINYL ACETATE-COPOLYMERIZED WATER EMULSION 1987-11-04 CN disclosed