⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL109023 | 0.92 | — | — | |
| Methane SCHEMBL1116289 | 0.88 | — | — | |
| Fluoride SCHEMBL28303577 | 0.88 | — | — | |
| SCHEMBL28058989 | 0.88 | — | — | |
| Water SCHEMBL28241835 | 0.88 | — | — | |
| SCHEMBL5961099 | 0.88 | — | — | |
| SCHEMBL10455387 | 0.88 | — | — | |
| Bromide SCHEMBL9709858 | 0.88 | — | — | |
| SCHEMBL2805168 | 0.88 | — | — | |
| Hydrochloric Acid SCHEMBL10570728 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108139671-A | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | 罗门哈斯电子材料韩国有限公司 | 2018-06-08 | — | — | CN | disclosed |
| CN-107428891-A | Curable composition | 施敏打硬株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-105392845-A | Photocurable composition | CEMEDINE CO LTD | 2016-03-09 | — | — | CN | disclosed |
| CN-101970507-A | Catalyst for olefin polymerization | BASELL POLYOLEFINE ITALIA S R L | 2011-02-09 | — | — | CN | disclosed |
| CN-1069675-C | Silica-based isolation film, material for manufacturing same, and process for producing same | HITACHI CHEMICAL CO LTD (JP) | 2001-08-15 | — | — | CN | disclosed |
| CN-1151752-A | Material for forming silica-base coated insulation film, process for producing the material, silica-base insulation film, semiconductor device, and process for producing the device | HITACHI CHEMICAL CO LTD (JP) | 1997-06-11 | — | — | CN | disclosed |