SCHEMBL273798

SCHEMBL273798

CCC(CC)=NO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28131033 0.96
Hydrochloric Acid SCHEMBL27730476 0.96
SCHEMBL20873208 0.93 ALDH1A1 (0.33)
Benzene SCHEMBL28158299 0.89 ATM (0.35)
SCHEMBL640375 0.79
SCHEMBL8012006 0.79
SCHEMBL11659595 0.79
SCHEMBL11847214 0.79
SCHEMBL8051807 0.79
SCHEMBL11847220 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1747 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122079812-A Preparation method of trans-3-chloro-2-propenyl hydroxylamine hydrochloride 2026-05-26 CN claimed
CN-119684899-A Marine antifouling paint based on fluorosilicone low-surface-energy resin 绵阳今为材料科技有限公司 2025-03-25 CN claimed
US-20240410074-A1 ELECTRODEPOSITION COATING COMPOSITION AND ITS PREPARATION BASF COATINGS GMBH (DE) 2024-12-12 US claimed
EP-4426766-A1 ELECTRODEPOSITION COATING COMPOSITION AND ITS PREPARATION BASF Coatings GmbH (DE) 2024-09-11 EP claimed
CN-115612344-B Covering flexography process 湖北中烟工业有限责任公司 2024-07-05 CN claimed
CN-115637076-B Covering red flexo printing ink and preparation method thereof 湖北中烟工业有限责任公司 2024-06-28 CN claimed
CN-118265735-A Electrodeposition coating composition and preparation thereof 巴斯夫涂料有限公司 2024-06-28 CN claimed
EP-2839058-B1 METHOD OF HEAT EXCHANGER DEPOSIT REMOVAL IN A WET LAYUP CONDITION WESTINGHOUSE ELECTRIC CO LLC (US) 2024-06-19 EP claimed
CN-108231573-B Etching composition and method for manufacturing semiconductor device by using the same 三星电子株式会社 2024-01-16 CN claimed
WO-2023078664-A1 ELECTRODEPOSITION COATING COMPOSITION AND ITS PREPARATION BASF COATINGS GMBH (DE) 2023-05-11 WO claimed
US-5026875-A Having ketoxime stabilizers; nondegradating, nonpolymerizing, formaldehyde-free MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1991-06-25 US claimed
EP-0343791-A1 Stability-improved trioxane composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1989-11-29 EP claimed
EP-0332400-A2 Photocurable organopolysiloxane composition Shin-Etsu Chemical Co., Ltd. (JP) 1989-09-13 EP claimed
US-4756785-A Process for the preparation of adhesives and their use for the formation of bonds BAYER AKTIENGESELLSCHAFT (DE) 1988-07-12 US claimed
EP-0224848-A2 Process for the preparation of bonding agents BAYER AG (DE) 1987-06-10 EP claimed
EP-0083293-B1 REMOVAL OF ACRYLONITRILE FROM LATEX WITH OXIMES THE GOODYEAR TIRE & RUBBER COMPANY (US) 1986-11-05 EP claimed
EP-0083293-A1 Removal of acrylonitrile from latex with oximes THE GOODYEAR TIRE & RUBBER COMPANY (US) 1983-07-06 EP claimed
US-4365027-A TO FORM CYANOETHYL OXIMINO ETHER LINKAGE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1982-12-21 US claimed
US-4224202-A DI- OR TRIMETHACRYLATE CROSSLINKING MONOMER, PROTECTED COBALT CATALYST, POLAR SOLVENT; QUICK-DRYING E. I. DU PONT DE NEMOURS AND COMPANY (US) 1980-09-23 US claimed
US-4056005-A Blocked isocyanate composition for forming T hermoparticulating coating WESTINGHOUSE ELECTRIC CORPORATION (US) 1977-11-01 US claimed