Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIK3CD | O00329 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21904717 | 0.87 | PIK3CD (0.32) | PIK3CDPTGS1PTGS2 | |
| SCHEMBL18721787 | 0.83 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL5703992 | 0.80 | PTGS1 (0.37) | PTGS1PTGS2 | |
| SCHEMBL12032236 | 0.79 | PIK3CD (0.32) | PIK3CD | |
| SCHEMBL9720983 | 0.79 | PTGS1 (0.33) | PTGS1PTGS2 | |
| SCHEMBL1994161 | 0.78 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL1470641 | 0.78 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL1470651 | 0.78 | PTGS1 (0.33) | PTGS1PTGS2 | |
| SCHEMBL12632857 | 0.77 | — | — | |
| SCHEMBL20901395 | 0.77 | PTGS1 (0.34) | PTGS1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11839476-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-12 | — | — | US | disclosed |
| US-20230320940-A1 | PHOTOCATIONICALLY CURABLE COMPOSITION AND DENTAL CURABLE COMPOSITION | TOKUYAMA DENTAL CORPORATION (JP) | 2023-10-12 | — | — | US | disclosed |
| US-20230320940-A1 | PHOTOCATIONICALLY CURABLE COMPOSITION AND DENTAL CURABLE COMPOSITION | TOKUYAMA DENTAL CORPORATION (JP) | 2023-10-12 | — | — | US | disclosed |
| US-20230148164-A1 | WATER BASED ANTI-ABRASION COATING | ESSILOR INTERNATIONAL (FR) | 2023-05-11 | — | — | US | disclosed |
| US-20230148164-A1 | WATER BASED ANTI-ABRASION COATING | ESSILOR INTERNATIONAL (FR) | 2023-05-11 | — | — | US | disclosed |
| US-20230130539-A1 | EPOXY-CURABLE SILICONE RELEASE COATING COMPOSITION AND METHODS FOR ITS PREPARATION AND USE | DOW SILICONES CORPORATION | 2023-04-27 | — | — | US | disclosed |
| US-20160314991-A1 | METHOD FOR PRODUCING COMPOSITION FOR FORMING COATING FILM FOR LITHOGRAPHY AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| US-9201304-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9138385-B2 | Microemulsion of polysiloxanes containing quaternary ammonium groups, production and use thereof | EVONIK DEGUSSA GMBH (DE) | 2015-09-22 | — | — | US | disclosed |
| US-9086626-B2 | Photo-patternable and developable silsesquioxane resins for use in device fabrication | DOW CORNING CORPORATION (US) | 2015-07-21 | — | — | US | disclosed |
| US-20080038662-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080032231-A1 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. | 2008-02-07 | — | — | US | disclosed |
| US-7303785-B2 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7303855-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20070172759-A1 | Antireflection film composition, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070122740-A1 | Resist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070117411-A1 | Rework process for photoresist film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-24 | — | — | US | disclosed |
| US-20070111134-A1 | solvent remove the first photoresist film, forming a second photoresist film over the second antireflection silicone resin film which is over the first antireflection silicone resin film; lower cost and provide an excellent resist pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-7202013-B2 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7163778-B2 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230320940-A1 | PHOTOCATIONICALLY CURABLE COMPOSITION AND DENTAL CURABLE COMPOSITION | CTH, GCLC, AAAS | PIK3CD 3653/4885PTGS1 834/4885PTGS2 830/4885 |
| US-11839476-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | AFF1, AFF4, AFF2 | PIK3CD 4079/4885PTGS1 1507/4885PTGS2 1958/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.