⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685664 | 0.89 | KDM4E (0.30) | — | |
| SCHEMBL19996962 | 0.89 | KDM4E (0.30) | — | |
| SCHEMBL24746359 | 0.89 | — | — | |
| SCHEMBL14330368 | 0.89 | — | — | |
| SCHEMBL21432112 | 0.89 | KDM4E (0.30) | — | |
| SCHEMBL13588094 | 0.87 | — | — | |
| SCHEMBL13594593 | 0.86 | — | — | |
| SCHEMBL14330359 | 0.86 | — | — | |
| SCHEMBL13496320 | 0.85 | — | — | |
| SCHEMBL13701177 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024128040-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD | 富士フイルム株式会社 | 2024-06-20 | — | — | WO | disclosed |