SCHEMBL2742284

SCHEMBL2742284

CCC(C)(C)C(=O)OCC(F)(C(F)(F)F)S(=O)(=O)O

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.30
CYP4A11 Q02928 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683677 0.86 CYP4F2 (0.32) CYP4F2CYP4A11
SCHEMBL17853402 0.80 CYP4F2 (0.30) CYP4F2CYP4A11
SCHEMBL686743 0.78 ALDH1A1 (0.36)
SCHEMBL12939332 0.77 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL18199031 0.77 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL10181613 0.77 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL17676419 0.77 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL10067052 0.77 CYP4F2 (0.30) CYP4F2CYP4A11
SCHEMBL13640669 0.76
SCHEMBL14770505 0.76 CYP4F2 (0.36) CYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8637220-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-01-28 US disclosed
US-20120003583-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed