SCHEMBL2742395

SCHEMBL2742395

CC(=O)O/N=C(\CCCSc1ccc(Cl)cc1)c1ccc(Sc2ccc(C(=O)c3ccccc3)cc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 3/20 0.42
▸ NPC1 O15118 1/20 0.42
▸ MEN1 O00255 1/20 0.41
▸ KMT2A Q03164 1/20 0.41
▸ HDAC3 O15379 1/20 0.40
▸ HDAC4 P56524 1/20 0.40
▸ HDAC1 Q13547 1/20 0.40
▸ HDAC7 Q8WUI4 1/20 0.40
▸ HDAC2 Q92769 1/20 0.40
▸ HDAC10 Q969S8 1/20 0.40
▸ HDAC11 Q96DB2 1/20 0.40
▸ HDAC8 Q9BY41 1/20 0.40
▸ HDAC6 Q9UBN7 1/20 0.40
▸ HDAC9 Q9UKV0 1/20 0.40
▸ HDAC5 Q9UQL6 1/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.39
▸ ALDH1A1 P00352 2/20 0.38
▸ PPARA Q07869 6/20 0.37
▸ PKM P14618 1/20 0.37
▸ HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15356435 0.90 KDM4E (0.39) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL12350155 0.88 RAB9A (0.40) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL14754912 0.87 MEN1 (0.39) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL21153924 0.85 HDAC1 (0.42) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL15499932 0.85 RAB9A (0.37) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL2742396 0.84 HTT (0.39) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL16976979 0.84 RAB9A (0.42) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL17069990 0.84 HTT (0.39) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL15499929 0.84 MEN1 (0.40) RAB9ANPC1MEN1KMT2AHDAC3
SCHEMBL15499930 0.83 MAPT (0.39) RAB9ANPC1MEN1KMT2AHDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3042934-B1 COLORED COMPOSITION, CURED FILM, COLOR FILTER, COLOR-FILTER MANUFACTURING METHOD, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, POLYMER, AND XANTHENE DYE FUJIFILM CORP (JP) 2022-11-09 — — EP disclosed
US-10703973-B2 Polymerizable composition, film, and half mirror for displaying projection image FUJIFILM CORPORATION (JP) 2020-07-07 — — US disclosed
US-10578966-B2 Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor FUJIFILM CORPORATION (JP) 2020-03-03 — — US disclosed
EP-2715416-B1 COLORED RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER, PATTERN FORMING METHOD, COLOR FILTER AND METHOD OF PRODUCING THE SAME, AND SOLID-STATE IMAGE SENSOR FUJIFILM CORP (JP) 2019-10-30 — — EP disclosed
US-10444625-B2 Coloring composition, cured film, color filter, method of manufacturing color filter, solid image pickup element, and image display apparatus FUJIFILM CORPORATION (JP) 2019-10-15 — — US disclosed
US-10436959-B2 Composition for color filter, infrared transmission filter and production method thereof, and infrared sensor FUJIFILM CORPORATION (JP) 2019-10-08 — — US disclosed
US-10409158-B2 Coloring composition, cured film, color filter, method for producing color filter, solid-state imaging element, and image display device FUJIFILM CORPORATION (JP) 2019-09-10 — — US disclosed
US-10401726-B2 Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor FUJIFILM CORPORATION (JP) 2019-09-03 — — US disclosed
US-10317794-B2 Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, image display device, organic electroluminescent element, colorant, and method for producing colorant FUJIFILM CORPORATION (JP) 2019-06-11 — — US disclosed
US-10287422-B2 Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device FUJIFILM CORPORATION (JP) 2019-05-14 — — US disclosed
US-20120235099-A1 RADIATION-SENSITIVE COLORED COMPOSITION, COLORED CURED FILM, COLOR FILTER AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, LIQUID CRYSTAL DISPLAY APPARATUS, AND METHOD OF PRODUCING DYE FUJIFILM CORPORATION (JP) 2012-09-20 — — US disclosed
US-20120202145-A1 RADIATION-SENSITIVE COLORED COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, SOLID STATE IMAGE DEVICE, AND LIQUID CRYSTAL DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-08-09 — — US disclosed
US-20120202145-A1 RADIATION-SENSITIVE COLORED COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, SOLID STATE IMAGE DEVICE, AND LIQUID CRYSTAL DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-08-09 — — US disclosed
US-20120104529-A1 COLORED COMPOSITION FOR LIGHT-SHIELDING FILM, LIGHT-SHIELDING PATTERN, METHOD FOR FORMING THE SAME, SOLID-STATE IMAGE SENSING DEVICE, AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2012-05-03 — — US disclosed
US-20120104529-A1 COLORED COMPOSITION FOR LIGHT-SHIELDING FILM, LIGHT-SHIELDING PATTERN, METHOD FOR FORMING THE SAME, SOLID-STATE IMAGE SENSING DEVICE, AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2012-05-03 — — US disclosed
WO-2012015076-A1 POLYMERIZABLE COMPOSITION FUJIFILM CORPORATION (JP) 2012-02-02 — — WO disclosed
US-20120003437-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL AND PHOTOSENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, PATTERN FILM, ANTIREFLECTION FILM, INSULATING FILM, OPTICAL DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2012-01-05 — — US disclosed
US-20120003437-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL AND PHOTOSENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, PATTERN FILM, ANTIREFLECTION FILM, INSULATING FILM, OPTICAL DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2012-01-05 — — US disclosed
US-20120003436-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FORMING METHOD, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE EACH USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-05 — — US disclosed
US-20120003436-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FORMING METHOD, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE EACH USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-05 — — US disclosed
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