⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10033690 | 0.82 | — | — | |
| SCHEMBL1754783 | 0.81 | THRB (0.32) | — | |
| SCHEMBL14703125 | 0.77 | TSHR (0.33) | — | |
| SCHEMBL13829223 | 0.76 | HMGCR (0.32) | — | |
| SCHEMBL10098424 | 0.75 | CHRM2 (0.33) | — | |
| SCHEMBL1104157 | 0.74 | CYP3A4 (0.30) | — | |
| SCHEMBL14279415 | 0.74 | THRB (0.32) | — | |
| SCHEMBL13829222 | 0.73 | CYP3A4 (0.37) | — | |
| SCHEMBL18195510 | 0.73 | HMGCR (0.35) | — | |
| SCHEMBL3148094 | 0.72 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8753801-B2 | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130126799-A1 | ELECTROCONDUCTIVE FILM, TOUCH PANEL AND SOLAR BATTERY | FUJIFILM CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20120024572-A1 | CONDUCTIVE COMPOSITION, TRANSPARENT CONDUCTOR USING THE SAME, AND TOUCH PANEL CONTAINING THE TRANSPARENT CONDUCTOR | FUJIFILM CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120003436-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FORMING METHOD, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |