SCHEMBL2742786

SCHEMBL2742786

CC(C)(C)CC(CCCS(=O)(=O)O)C(C)(C)C

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742787 0.88 S1PR2 (0.31)
SCHEMBL2742785 0.75 SLC22A6 (0.33)
SCHEMBL23781788 0.72 APP (0.43) APP
SCHEMBL14030528 0.72 APP (0.31) APP
SCHEMBL22551551 0.69 LMNA (0.42) APP
SCHEMBL18056096 0.69 APP (0.32) APP
SCHEMBL13657447 0.69 APP (0.32) APP
SCHEMBL8620435 0.68 APP (0.46) APP
SCHEMBL329052 0.68 APP (0.46) APP
SCHEMBL5144485 0.66 APP (0.44) APP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8088537-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-03 US disclosed
US-20090197200-A1 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-06 US disclosed