SCHEMBL27436740

SCHEMBL27436740

CC(OC(=O)C12CC3CC(CC(C3)C1)C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 4/20 0.50
CYP19A1 P11511 4/20 0.50
SCN1A P35498 1/20 0.41
SCN2A Q99250 1/20 0.41
SCN3A Q9NY46 1/20 0.41
MAPT P10636 2/20 0.40
GAA P10253 1/20 0.40
XBP1 P17861 1/20 0.40
GLA P06280 1/20 0.39
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
ALDH1A1 P00352 2/20 0.38
LMNA P02545 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
PRKCA P17252 1/20 0.37
EPHX2 P34913 1/20 0.37
MAPK1 P28482 1/20 0.36
HTT P42858 1/20 0.36
RAB9A P51151 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25494213 0.85 CYP17A1 (0.53) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL17404446 0.82 CYP17A1 (0.50) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL17300354 0.81 CYP17A1 (0.47) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL131064 0.81 CYP17A1 (0.55) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL24360807 0.78 CYP17A1 (0.47) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL17590217 0.78 CYP17A1 (0.43) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL14326071 0.78 CYP17A1 (0.47) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL3425078 0.78 CYP17A1 (0.53) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL26861811 0.78 CYP17A1 (0.44) CYP17A1CYP19A1SCN1ASCN2ASCN3A
SCHEMBL17297600 0.77 CYP17A1 (0.42) CYP17A1CYP19A1SCN1ASCN2ASCN3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed