Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 4/20 | 0.55 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.55 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | SCN1A | P35498 | 1/20 | 0.45 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.45 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | XBP1 | P17861 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | PRKCA | P17252 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30798137 | 0.91 | CYP17A1 (0.46) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL136663 | 0.88 | NPSR1 (0.49) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| Acrolein SCHEMBL5410241 | 0.88 | CYP17A1 (0.47) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL23618714 | 0.84 | CYP17A1 (0.43) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL23618709 | 0.84 | CYP17A1 (0.47) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL25494213 | 0.84 | CYP17A1 (0.53) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL3425078 | 0.84 | CYP17A1 (0.53) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL5080907 | 0.83 | CYP17A1 (0.41) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL3422219 | 0.83 | MEN1 (0.49) | CYP17A1CYP19A1MEN1KMT2AMAPK1 | |
| SCHEMBL5437290 | 0.83 | CYP17A1 (0.43) | CYP17A1CYP19A1MEN1KMT2AMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 851 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | claimed |
| US-12517429-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-20250377590-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250321484-A1 | METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2025-10-16 | — | — | US | disclosed |
| US-12422748-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| US-12372869-B2 | Method for forming resist pattern and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-12265331-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-12092957-B2 | Radiation-sensitive resin composition, method for forming resist pattern and compound | JSR CORPORATION (JP) | 2024-09-17 | — | — | US | disclosed |
| US-11966160-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6251560-B1 | PHOTOLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-06-26 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| CN-1272637-A | Photoresist composite containing cycloolefine polymer and hydrophobic non-steroidal alicyclic additive | IBM (US) | 2000-11-08 | — | — | CN | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-6004720-A | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 1999-12-21 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0663616-A2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 1995-07-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, XRCC5, F12 | CYP17A1 2352/4885CYP19A1 2673/4885MEN1 1944/4885 |
| US-12422748-B2 | Radiation-sensitive resin composition and method for forming resist pattern | RER1, XRCC5, F12 | CYP17A1 2362/4885CYP19A1 2712/4885MEN1 1938/4885 |
| US-12092957-B2 | Radiation-sensitive resin composition, method for forming resist pattern and compound | RER1, RFT1, RAD51 | CYP17A1 1952/4885CYP19A1 2228/4885MEN1 2363/4885 |
| US-20250377590-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, RAD51, RFC2 | CYP17A1 2555/4885CYP19A1 2082/4885MEN1 2526/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.