SCHEMBL27484748

SCHEMBL27484748

CCCCC(CCC)(c1nc2ccccc2[nH]1)c1nc2ccccc2[nH]1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPSR1 Q6W5P4 1/20 0.50
▸ NPC1 O15118 2/20 0.49
▸ RAB9A P51151 2/20 0.49
▸ BCHE P06276 1/20 0.49
▸ TRPC3 Q13507 1/20 0.49
▸ TRPC4 Q9UBN4 1/20 0.49
▸ TRPC5 Q9UL62 1/20 0.49
▸ DDAH1 O94760 1/20 0.46
▸ ALDH1A1 P00352 2/20 0.43
▸ SMN1; SMN2 Q16637 1/20 0.43
▸ POLB P06746 1/20 0.42
▸ SPHK2 Q9NRA0 1/20 0.42
▸ SPHK1 Q9NYA1 1/20 0.42
▸ KDM4E B2RXH2 2/20 0.42
▸ LMNA P02545 1/20 0.42
▸ CYP1A2 P05177 1/20 0.42
▸ CYP2D6 P10635 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ TXN P10599 1/20 0.41
▸ TSHR P16473 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14361622 0.83 NPSR1 (0.51) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL14361782 0.81 NPSR1 (0.49) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL14361607 0.80 NPSR1 (0.54) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL22926257 0.80 NPSR1 (0.54) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL14361831 0.78 NPSR1 (0.49) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL22017306 0.73 NPSR1 (0.44) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL229852 0.73 NPSR1 (0.68) NPSR1NPC1RAB9ADDAH1ALDH1A1
SCHEMBL13073559 0.72 NPSR1 (0.58) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL20283848 0.72 NPSR1 (0.58) NPSR1NPC1RAB9ABCHETRPC3
SCHEMBL5626454 0.72 SPHK2 (0.50) NPSR1NPC1RAB9ABCHETRPC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113574092-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, pattern formation method, and purification method 三菱瓦斯化学株式会社 2021-10-29 — — CN disclosed
CN-102336911-B Polybenzimidazole with sulfonyl azide base groups and synthetic method thereof UNIV TONGJI 2013-06-05 — — CN disclosed
CN-102336911-A Polybenzimidazole with sulfonyl azide base groups and synthetic method thereof UNIV TONGJI 2012-02-01 — — CN disclosed
CN-101223211-B Two-stage melt polymerization process for producing polybenzimidazole PBI PERFORMANCE PRODUCTS INC 2011-10-19 — — CN disclosed
CN-101367903-B Enhancement type composite proton exchanging film based on semi-interpenetrating network and preparation method thereof UNIV TONGJI 2011-01-19 — — CN disclosed
CN-101338072-B Organic/inorganic composite enhancement type anhydrous proton conducting film and method for preparing same UNIV TONGJI 2010-09-22 — — CN disclosed
CN-100580007-C Process for two stage melt polymerization for the production of polybenzimidazole having improved solid state polymerization PBI PERFORMANCE PRODUCTS INC 2010-01-13 — — CN disclosed
CN-101367903-A Enhancement type composite proton exchanging film based on semi-interpenetrating network UNIV TONGJI (CN) 2009-02-18 — — CN disclosed
CN-101338072-A Organic/inorganic composite enhancement type anhydrous proton conducting film and method for preparing same UNIV TONGJI (CN) 2009-01-07 — — CN disclosed
CN-101223211-A Two-stage melt polymerization process for producing polybenzimidazole PBI PERFORANCE PRODUCTS INC (US) 2008-07-16 — — CN disclosed
CN-1980982-A Process for a two stage melt polymerization for the production of polybenzimidazole having an improved solid state polymerization PBI PERFORMANCE PRODUCTS INC (US) 2007-06-13 — — CN disclosed
CN-1413233-A Sliding material CLARIANT INT LTD (CH) 2003-04-23 — — CN disclosed
CN-1202477-A Carbonylation process BP CHEM INT LTD (GB) 1998-12-23 — — CN disclosed
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