SCHEMBL27494166

SCHEMBL27494166

CCCCCCCCCC[Si](Cl)(Cl)Cl.FC1CC=Cc2c1ccc1c2ccc2ccccc21

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.33
SLC6A4 P31645 1/20 0.33
KDM4E B2RXH2 4/20 0.32
NPC1 O15118 4/20 0.32
ALDH1A1 P00352 4/20 0.32
GAA P10253 4/20 0.32
HTT P42858 4/20 0.32
RAB9A P51151 4/20 0.32
SMN1; SMN2 Q16637 4/20 0.32
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
NPSR1 Q6W5P4 2/20 0.32
LMNA P02545 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2D6 P10635 1/20 0.32
HPGD P15428 1/20 0.32
CYP2C19 P33261 1/20 0.32
MAPK1 P28482 1/20 0.32
RAD52 P43351 1/20 0.32
GLA P06280 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27717050 1.00 DRD2 (0.33) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL27708138 1.00 DRD2 (0.33) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL27772264 1.00 DRD2 (0.33) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL27823751 0.93 DRD2 (0.32) DRD2SLC6A4KDM4ENPC1ALDH1A1
Octane SCHEMBL28034052 0.91 KDM4E (0.37) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL28767350 0.88 DRD2 (0.32) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL27781701 0.88 DRD2 (0.32) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL27465799 0.88 DRD2 (0.32) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL28767377 0.87 DRD2 (0.31) DRD2SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL27465800 0.87 DRD2 (0.31) DRD2SLC6A4KDM4ENPC1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104619791-A Apparatus with a liquid-impregnated surface MASSACHUSETTS INST TECHNOLOGY 2015-05-13 CN claimed
CN-104254579-B Modification of surfaces for fluid and solid repellency 哈佛学院院长等 2018-05-29 CN disclosed
CN-104409082-B Sliding part with self-assembled monolayer pattern 希捷科技有限公司 2018-03-30 CN disclosed
CN-104220382-B Measurement system, desalination system and desalination method used in desalination system 松下知识产权经营株式会社 2017-03-29 CN disclosed
CN-104203833-B Desalination system and desalination method 松下知识产权经营株式会社 2017-02-22 CN disclosed
CN-104661762-B Pattern forming method, electronic wiring board, optical element, and pattern forming apparatus 富士胶片株式会社 2016-11-09 CN disclosed
CN-104145325-B Pattern forming method 富士胶片株式会社 2016-08-24 CN disclosed
CN-104160487-B Pattern forming method 富士胶片株式会社 2016-08-24 CN disclosed
CN-103941390-B Method for manufacturing electrowetting element 财团法人工业技术研究院 2016-06-29 CN disclosed
CN-103293661-B Electrowetting display element INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (CN) 2016-02-03 CN disclosed
CN-1536949-A Image forming method, image forming device and its mfg. method ������������ʽ���� 2004-10-13 CN disclosed
CN-1532053-A Device and its producing method, photoelectric device and electronic machine ������������ʽ���� 2004-09-29 CN disclosed
CN-1531389-A Image forming method and device, manufacture of device, conductive film layout, photoelectric device and electronic machine ������������ʽ���� 2004-09-22 CN disclosed
CN-1152882-C Preparation method of alkoxysilane 1 2004-06-09 CN disclosed
CN-1501436-A Method for forming film pattern, thin film manufacturing apparatus, and conductive film wiring ������������ʽ���� 2004-06-02 CN disclosed
CN-1459372-A Pattern forming apparatus and method, method for manufacturing conductive film wiring, and electronic device SEIKO EPSON CORP (JP) 2003-12-03 CN disclosed
CN-1459824-A Surface treatment method and film pattern forming method SEIKO EPSON CORP (JP) 2003-12-03 CN disclosed
CN-1453608-A Forming method of electroconductive film distribution film structural body, electrooptical apparatus and electronic instrument SEIKO EPSON CORP (JP) 2003-11-05 CN disclosed
CN-1451543-A Method for mfg. piezoelectrics elements, piezoelectrics element and drop jet type recording head SEIKO EPSON CORP (JP) 2003-10-29 CN disclosed
CN-1302806-A Preparation method of alkoxysilane DEGUSSA (DE) 2001-07-11 CN disclosed