⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29000521 | 1.00 | TSHR (0.67) | — | |
| Hydrochloric Acid SCHEMBL27575104 | 0.97 | — | — | |
| Propane SCHEMBL8063536 | 0.95 | TSHR (0.60) | — | |
| Acetic Acid SCHEMBL28820394 | 0.92 | TSHR (0.57) | — | |
| Cyclopropane SCHEMBL28093239 | 0.92 | TSHR (0.57) | — | |
| SCHEMBL1357249 | 0.86 | TSHR (0.50) | — | |
| SCHEMBL15902482 | 0.86 | GAA (0.52) | — | |
| SCHEMBL10262406 | 0.85 | TSHR (0.55) | — | |
| Lactic Acid SCHEMBL8929812 | 0.84 | TSHR (0.48) | — | |
| Propylene Glycol SCHEMBL28735941 | 0.84 | TSHR (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 30290 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| CN-122095033-A | Formulations | — | 2026-05-26 | — | — | CN | claimed |
| US-20260140450-A1 | LIQUID CHEMICAL AND METHOD FOR PRODUCING LIQUID CHEMICAL | FUJIFILM CORPORATION (JP) | 2026-05-21 | — | — | US | claimed |
| WO-2026104328-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2026-05-21 | — | — | WO | claimed |
| CN-122037616-A | Pigment red 254 kneading inducer and application thereof | 重庆安尚科技有限公司 | 2026-05-15 | — | — | CN | claimed |
| US-12619144-B2 | Positive photosensitive resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2026-05-05 | — | — | US | claimed |
| EP-3870960-B1 | CHEMICAL LIQUID MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING CHEMICAL LIQUID | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-04-15 | — | — | EP | claimed |
| EP-4072992-B1 | COMPOSITION | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-04-08 | — | — | EP | claimed |
| CN-120484664-B | Waterproof coating containing methyl 3-methoxypropionate | 深圳市普利凯新材料股份有限公司 | 2026-02-27 | — | — | CN | claimed |
| EP-3883663-B9 | CHEMICAL LIQUID MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF CHEMICAL LIQUID | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-25 | — | — | EP | claimed |
| US-5068399-A | PROCESS FOR PREPARING UNSATURATED CARBOXYLIC ACID ESTER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-11-26 | — | — | US | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0429800-A2 | Process for preparing unsaturated carboxylic acid ester | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-06-05 | — | — | EP | claimed |
| EP-0408635-A1 | TRANSESTERIFICATION OF ALKOXYESTERS. | EASTMAN KODAK CO (US) | 1991-01-23 | — | — | EP | claimed |
| US-4946837-A | ANTIBIOTICS | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1990-08-07 | — | — | US | claimed |
| US-4898969-A | Transesterification of alkoxyesters | EASTMAN KODAK COMPANY (US) | 1990-02-06 | — | — | US | claimed |
| WO-1989009762-A1 | TRANSESTERIFICATION OF ALKOXYESTERS | EASTMAN KODAK COMPANY (US) | 1989-10-19 | — | — | WO | claimed |
| US-4814492-A | Method of preparing alkyl acrylates | TEXACO INC. (US) | 1989-03-21 | — | — | US | claimed |
| EP-0273026-A2 | Solvents for Photoresist compositions | SHIPLEY COMPANY INC. (US) | 1988-06-29 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |