SCHEMBL27548639

SCHEMBL27548639

CCOc1cc2c3c(ccc2c2ccccc12)CCCC3.O=c1cccco1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.39
▸ KDM4E B2RXH2 4/20 0.39
▸ CA1 P00915 1/20 0.36
▸ CA9 Q16790 1/20 0.36
▸ HPGD P15428 2/20 0.35
▸ TSHR P16473 3/20 0.35
▸ SMN1; SMN2 Q16637 2/20 0.35
▸ RXFP1 Q9HBX9 1/20 0.34
▸ HTT P42858 1/20 0.34
▸ MCOLN3 Q8TDD5 1/20 0.34
▸ LMNA P02545 1/20 0.34
▸ CYP2A6 P11509 1/20 0.34
▸ MAPT P10636 3/20 0.34
▸ NPC1 O15118 2/20 0.34
▸ RAB9A P51151 2/20 0.34
▸ CASP3 P42574 1/20 0.34
▸ SENP8 Q96LD8 1/20 0.34
▸ SENP7 Q9BQF6 1/20 0.34
▸ SENP6 Q9GZR1 1/20 0.34
▸ POLB P06746 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27484937 0.87 ALDH1A1 (0.38) ALDH1A1KDM4ECA1CA9TSHR
SCHEMBL27369368 0.84 CA1 (0.39) ALDH1A1KDM4ECA1CA9HPGD
Ether SCHEMBL28248062 0.80 NQO1 (0.38) ALDH1A1KDM4ECA1CA9MAPT
SCHEMBL28781324 0.79 ALDH1A1 (0.36) ALDH1A1KDM4ECA1CA9HPGD
SCHEMBL28815404 0.78 MAPT (0.35) ALDH1A1KDM4ECA1CA9LMNA
SCHEMBL27768360 0.78 MAPT (0.35) ALDH1A1KDM4ECA1CA9LMNA
SCHEMBL27579712 0.78 MAPT (0.35) ALDH1A1KDM4ECA1CA9LMNA
SCHEMBL27839700 0.76 CA1 (0.36) ALDH1A1KDM4ECA1CA9TSHR
SCHEMBL27267954 0.76 CA1 (0.43) ALDH1A1KDM4ECA1CA9HPGD
SCHEMBL27735209 0.76 CA1 (0.32) CA1CA9NQO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1231816-C Photoresist compositions SUMITOMO CHEMICAL CO (JP) 2005-12-14 — — CN disclosed
CN-1167982-C Photoresist composition 住友化学工业株式会社 2004-09-22 — — CN disclosed
CN-1235281-A Photoresist composition SUMITOMO CHEMICAL CO (JP) 1999-11-17 — — CN disclosed
CN-1230704-A Photoresist compositions SUMITOMO CHEMICAL CO (JP) 1999-10-06 — — CN disclosed
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