Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | TMEM97 | Q5BJF2 | 2/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | UGT2B7 | P16662 | 1/20 | 0.32 |
| ▸ | PRKD3 | O94806 | 2/20 | 0.31 |
| ▸ | PRKCG | P05129 | 2/20 | 0.31 |
| ▸ | PRKCB | P05771 | 2/20 | 0.31 |
| ▸ | PRKCA | P17252 | 2/20 | 0.31 |
| ▸ | PRKCH | P24723 | 2/20 | 0.31 |
| ▸ | PRKCI | P41743 | 2/20 | 0.31 |
| ▸ | PRKCE | Q02156 | 2/20 | 0.31 |
| ▸ | PRKCQ | Q04759 | 2/20 | 0.31 |
| ▸ | PRKCZ | Q05513 | 2/20 | 0.31 |
| ▸ | PRKCD | Q05655 | 2/20 | 0.31 |
| ▸ | PRKD1 | Q15139 | 2/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21409613 | 1.00 | CA2 (0.40) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL21409717 | 1.00 | CA2 (0.40) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL714194 | 0.98 | CA2 (0.41) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL20707235 | 0.98 | CA2 (0.41) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL9152721 | 0.93 | CA2 (0.38) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL4929770 | 0.92 | CA2 (0.42) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL1243925 | 0.92 | CA2 (0.42) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL929572 | 0.92 | CA2 (0.42) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL9152542 | 0.89 | CA2 (0.49) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 | |
| SCHEMBL649656 | 0.84 | CA2 (0.44) | CA2ALDH1A1TMEM97SIGMAR1NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3839028-B1 | CLEANING PRODUCT | PROCTER & GAMBLE (US) | 2025-01-15 | — | — | EP | disclosed |
| US-11834627-B2 | Cleaning product | THE PROCTER & GAMBLE COMPANY (US) | 2023-12-05 | — | — | US | disclosed |
| WO-2021126645-A1 | CLEANING PRODUCT | THE PROCTER & GAMBLE COMPANY (US) | 2021-06-24 | — | — | WO | disclosed |
| EP-3839028-A1 | CLEANING PRODUCT | The Procter & Gamble Company (US) | 2021-06-23 | — | — | EP | disclosed |
| US-20210179971-A1 | CLEANING PRODUCT | THE PROCTER & GAMBLE COMPANY | 2021-06-17 | — | — | US | disclosed |
| WO-2019188140-A1 | LIQUID DETERGENT COMPOSITION | ライオン株式会社 | 2019-10-03 | — | — | WO | disclosed |
| US-8541161-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8541161-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20120003586-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20120003586-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| WO-2010110472-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | WO | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-5442089-A | Nomoner for polyesters, polyurethanes, polycarbonates | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1995-08-15 | — | — | US | disclosed |
| US-5212015-A | A substrate with polyether-polyester-polyurethane copolymers and polycarbonates for radiation transparent coatings | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-05-18 | — | — | US | disclosed |
| US-5163060-A | Polyesters, polyurethanes, polycarbonates with nonlinear optical response | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-11-10 | — | — | US | disclosed |
| US-5093456-A | Polyesters, polyurethanes, polycarbonates, lasers, harmonics | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-03-03 | — | — | US | disclosed |
| EP-0403132-A2 | Monocarbamate diols, polymers derived from them, and NLO-active materials therefrom | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-12-19 | — | — | EP | disclosed |