Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIM1 | P11309 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23637798 | 0.88 | PIM1 (0.33) | PIM1 | |
| SCHEMBL23049946 | 0.76 | CA1 (0.50) | — | |
| SCHEMBL9350913 | 0.69 | PIM1 (0.79) | PIM1 | |
| SCHEMBL7559713 | 0.56 | IGF1R (0.35) | PIM1 | |
| SCHEMBL19373005 | 0.56 | THRB (0.30) | — | |
| Phloroglucinol SCHEMBL5071422 | 0.56 | BACE1 (0.80) | PIM1 | |
| SCHEMBL19730540 | 0.56 | TTR (0.33) | — | |
| SCHEMBL10826817 | 0.56 | — | — | |
| SCHEMBL13199249 | 0.56 | IGF1R (0.35) | PIM1 | |
| SCHEMBL3058655 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113631963-B | Polyester carbonate resin and molded article obtained by molding resin composition containing same | 三菱瓦斯化学株式会社 | 2022-11-18 | — | — | CN | disclosed |
| CN-113631963-A | Polyester carbonate resin and molded article obtained by molding resin composition containing same | 三菱瓦斯化学株式会社 | 2021-11-09 | — | — | CN | disclosed |
| CN-113075346-A | Gas chromatography separation analysis method based on aromatic macrocycle, molecular cage and pillar quinone and application | 天津师范大学 | 2021-07-06 | — | — | CN | disclosed |
| CN-101034256-B | Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof | FUJITSU LTD | 2010-12-29 | — | — | CN | disclosed |
| CN-100478780-C | Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same | FUJITSU LTD (JP) | 2009-04-15 | — | — | CN | disclosed |
| CN-101034256-A | Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof | FUJITSU LTD (JP) | 2007-09-12 | — | — | CN | disclosed |
| CN-1421744-A | Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same | FUJITSU LTD (JP) | 2003-06-04 | — | — | CN | disclosed |