Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CLK4 | Q9HAZ1 | 3/20 | 0.49 |
| ▸ | MAPT | P10636 | 5/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 6/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 4/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.40 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.40 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.39 |
| ▸ | XDH | P47989 | 1/20 | 0.39 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.39 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.39 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL644691 | 0.85 | CLK4 (0.47) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL28849727 | 0.84 | CLK4 (0.61) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL1044951 | 0.82 | CLK4 (0.50) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL29043172 | 0.79 | CLK4 (0.52) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL29428939 | 0.77 | S1PR1 (0.58) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL6949389 | 0.77 | S1PR1 (0.58) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL7917933 | 0.76 | MAPT (0.69) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL30760718 | 0.76 | S1PR1 (0.57) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL27719386 | 0.76 | CLK4 (0.52) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL14432249 | 0.76 | KMT2A (0.53) | CLK4MAPTKDM4ETP53NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117075428-A | Negative photosensitive resin composition | DIC株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-110959138-B | Resist material | DIC株式会社 | 2023-06-30 | — | — | CN | disclosed |
| CN-115480447-A | Negative photosensitive resin composition | DIC株式会社 | 2022-12-16 | — | — | CN | disclosed |
| CN-113348188-A | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2021-09-03 | — | — | CN | disclosed |
| CN-108368214-B | Novolac resin and resist film | DIC株式会社 | 2021-03-23 | — | — | CN | disclosed |
| CN-108290828-B | Oxime ester compound having excellent thermal stability, photopolymerization initiator containing the same, and photosensitive resin composition | 京仁洋行股份有限公司 | 2021-01-26 | — | — | CN | disclosed |
| CN-108368213-B | Novolac resin and resist film | DIC株式会社 | 2020-12-18 | — | — | CN | disclosed |
| CN-107003612-B | Photosensitive composition for forming resist underlayer film, and resist underlayer film | DIC株式会社 | 2020-11-06 | — | — | CN | disclosed |
| CN-110959138-A | Resist material | DIC株式会社 | 2020-04-03 | — | — | CN | disclosed |
| CN-108290828-A | Oxime ester compound having excellent thermal stability, photopolymerization initiator containing the same, and photosensitive resin composition | 京仁洋行股份有限公司 | 2018-07-17 | — | — | CN | disclosed |
| CN-105555820-A | Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating | DAINIPPON INK & CHEMICALS | 2016-05-04 | — | — | CN | disclosed |
| CN-105190439-A | Modified phenolic novolac resin, resist material, coating film, and permanent resist film | DAINIPPON INK & | 2015-12-23 | — | — | CN | disclosed |
| CN-1527808-A | Process for production of fluorine-containing norbornene derivatives | ͬ�Ϳ�ҵ��ʽ���� | 2004-09-08 | — | — | CN | disclosed |