Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 4/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 6/20 | 0.44 |
| ▸ | RAB9A | P51151 | 4/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.44 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.44 |
| ▸ | XDH | P47989 | 1/20 | 0.43 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.43 |
| ▸ | SYK | P43405 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22129825 | 0.83 | CLK4 (0.48) | CLK4MAPTKDM4ETP53CYP1A1 | |
| SCHEMBL36116 | 0.83 | CLK4 (0.48) | CLK4MAPTKDM4ETP53CYP1A1 | |
| SCHEMBL27587282 | 0.82 | CLK4 (0.49) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL10068859 | 0.81 | CLK4 (0.47) | CLK4MAPTKDM4ETP53CYP1A1 | |
| SCHEMBL338452 | 0.81 | CLK4 (0.64) | CLK4MAPTKDM4ETP53CYP1A1 | |
| Ethylene SCHEMBL22497430 | 0.80 | CLK4 (0.46) | CLK4MAPTKDM4ETP53CYP1A1 | |
| SCHEMBL326391 | 0.79 | CLK4 (0.48) | CLK4MAPTKDM4ETP53CYP1A1 | |
| SCHEMBL15896952 | 0.79 | CLK4 (0.61) | CLK4MAPTKDM4ETP53CYP1A1 | |
| SCHEMBL2876553 | 0.79 | CLK4 (0.61) | CLK4MAPTKDM4ETP53CYP1A1 | |
| SCHEMBL9849715 | 0.78 | CYP1A2 (0.40) | MAPTTP53CYP1A1CYP1A2CYP1B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119668028-A | Negative photoresist composition, application thereof and imaging method | 福建泓光半导体材料有限公司 | 2025-03-21 | — | — | CN | claimed |
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | claimed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | claimed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | claimed |
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| CN-119668028-A | Negative photoresist composition, application thereof and imaging method | 福建泓光半导体材料有限公司 | 2025-03-21 | — | — | CN | disclosed |
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117075428-A | Negative photosensitive resin composition | DIC株式会社 | 2023-11-17 | — | — | CN | disclosed |
| US-11746255-B2 | Hard-mask composition | IRRESISTIBLE MATERIALS LTD (GB) | 2023-09-05 | — | — | US | disclosed |
| CN-110959138-B | Resist material | DIC株式会社 | 2023-06-30 | — | — | CN | disclosed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| EP-0621509-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| US-5292614-A | Bis(triaminotriazine) | MITSUBISHI KASEI CORPORATION (JP) | 1994-03-08 | — | — | US | disclosed |
| US-5286600-A | Negative photosensitive composition and method for forming a resist pattern by means thereof | MITSUBISHI KASEI CORPORATION (JP) | 1994-02-15 | — | — | US | disclosed |
| EP-0458325-A1 | Negative photosensitive composition and method for forming a resist pattern | Mitsubishi Chemical Corporation (JP) | 1991-11-27 | — | — | EP | disclosed |
| US-4845011-A | BASIFIED ACRIDINE COMPOUND, A TRIAZINE OR QUINAZOLINONE COMPOUND | HOECHST CELANESE CORPORATION (US) | 1989-07-04 | — | — | US | disclosed |
| EP-0313007-A2 | Mixture polymerised by visible light | HOECHST CELANESE CORPORATION (US) | 1989-04-26 | — | — | EP | disclosed |