⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28960706 | 0.98 | — | — | |
| SCHEMBL246472 | 0.86 | — | — | |
| SCHEMBL2759409 | 0.86 | — | — | |
| SCHEMBL2759420 | 0.84 | — | — | |
| SCHEMBL2759416 | 0.82 | CYP4F2 (0.32) | — | |
| SCHEMBL2759424 | 0.82 | CYP4F2 (0.32) | — | |
| SCHEMBL2759417 | 0.82 | CYP4F2 (0.32) | — | |
| SCHEMBL1771973 | 0.82 | — | — | |
| SCHEMBL2759413 | 0.82 | CYP4F2 (0.32) | — | |
| SCHEMBL2759418 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115594790-A | Photosensitive polymer containing photoacid generator and preparation method thereof | 苏州威迈芯材半导体有限公司（CN） | 2023-01-13 | — | — | CN | disclosed |
| US-9024058-B2 | Ammonium fluoroalkanesulfonates and a synthesis method therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8907122-B2 | Method of preparing photoacid generating monomer | ROHM AND HAAS ELECTRONIC MATERIAL LLC (US) | 2014-12-09 | — | — | US | disclosed |
| US-8716518-B2 | Photoacid generating monomer and precursor thereof | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-05-06 | — | — | US | disclosed |
| US-20120172619-A1 | METHOD OF PREPARING PHOTOACID GENERATING MONOMER | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2012-07-05 | — | — | US | disclosed |
| US-20120172555-A1 | PHOTOACID GENERATING MONOMER AND PRECURSOR THEREOF | DOW GLOBAL TECHNOLOGIES LLC | 2012-07-05 | — | — | US | disclosed |
| US-20120004447-A1 | Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-05 | — | — | US | disclosed |
| US-8026039-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2011-09-27 | — | — | US | disclosed |
| US-7956142-B2 | Polymerizable sulfonic acid onium salt and resin | JSR CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100040977-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |