SCHEMBL2759409

SCHEMBL2759409

O=S(O)C(F)(F)C(F)(F)CCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2759420 0.98
SCHEMBL2759413 0.96 CYP4F2 (0.32)
SCHEMBL1771973 0.96
SCHEMBL2759424 0.96 CYP4F2 (0.32)
SCHEMBL2759416 0.96 CYP4F2 (0.32)
SCHEMBL2759417 0.96 CYP4F2 (0.32)
SCHEMBL2759405 0.86
SCHEMBL28960706 0.84
SCHEMBL1771975 0.77
SCHEMBL2759422 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9024058-B2 Ammonium fluoroalkanesulfonates and a synthesis method therefor CENTRAL GLASS COMPANY, LIMITED (JP) 2015-05-05 US disclosed
US-20120004447-A1 Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor CENTRAL GLASS COMPANY, LIMITED (JP) 2012-01-05 US disclosed
US-7897821-B2 Sulfonium compound JSR CORPORATION (JP) 2011-03-01 US disclosed
US-20100324329-A1 COMPOUND JSR CORPORATION (JP) 2010-12-23 US disclosed
US-7812105-B2 Compound, polymer, and radiation-sensitive composition JSR CORPORATION (JP) 2010-10-12 US disclosed
US-20090069521-A1 Novel Compound, Polymer, and Radiation-Sensitive Composition JSR CORPORATION (JP) 2009-03-12 US disclosed