SCHEMBL2760604

SCHEMBL2760604

COC(=O)C(CC(C)(C)C)C(C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.38
CA14 Q9ULX7 4/20 0.38
CA12 O43570 3/20 0.38
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
USP2 O75604 1/20 0.33
LMNA P02545 1/20 0.33
MMP8 P22894 1/20 0.32
ZDHHC7 Q9NXF8 1/20 0.31
BIRC2 Q13490 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15996697 0.84
SCHEMBL18459964 0.83 SMN1; SMN2 (0.35) SMN1; SMN2CA14CA12CA1CA2
SCHEMBL19449350 0.82 CA1 (0.39) SMN1; SMN2CA1CA2
SCHEMBL284234 0.82
SCHEMBL10240193 0.81
SCHEMBL2760523 0.81 CA1 (0.37) SMN1; SMN2CA14CA12CA1CA2
SCHEMBL13784620 0.81 CA1 (0.37) SMN1; SMN2CA14CA12CA1CA2
SCHEMBL19496142 0.80
SCHEMBL22810787 0.80 CA1 (0.35) CA1CA2CA7LMNA
SCHEMBL10069151 0.80 ALDH1A1 (0.39) LMNAMMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230159488-A1 APPLICATION OF HETEROCYCLIC COMPOUND CONTAINING AT LEAST TWO SULFUR ATOMS IN PREPARING NANO-VACCINE AND PREPARED NANO-VACCINE Suzhou WEAST Biotechnology Co., Ltd. (CN) 2023-05-25 US disclosed
US-9796803-B2 Under layer film-forming composition for imprints and method of forming pattern FUJIFILM CORPORATION (JP) 2017-10-24 US disclosed
EP-2321233-B1 DISPERSING AGENTS FOR GYPSUM PLASTER COMPOSITIONS SIKA TECH AG (CH) 2017-03-22 EP disclosed
US-9540513-B2 Lignocellulosic article and method of producing same BASF SE (DE) 2017-01-10 US disclosed
US-20160327859-A1 COLORING COMPOSITION, AND CURED FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, AND DYE MULTIMER, EACH USING THE COLORING COMPOSITION FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
EP-1536285-B1 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition FUJIFILM CORP (JP) 2016-01-06 EP disclosed
US-9159356-B2 Non-resonant two-photon absorption recording material, non-resonant polymer two-photon absorption optical information recording medium, and recording/reproducing method FUJIFILM CORPORATION (JP) 2015-10-13 US disclosed
US-9120288-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2015-09-01 US disclosed
US-20140142224-A1 LIGNOCELLULOSIC ARTICLE AND METHOD OF PRODUCING SAME BASF SE (DE) 2014-05-22 US disclosed
US-20140053755-A1 Cellulose Acylate Film, Retardation Film, Polarizer and Liquid Crystal Display Device FUJIFILM CORPORATION (JP) 2014-02-27 US disclosed
EP-2269817-A1 HYDROPHILIC MEMBER, FIN MEMBER, ALUMINUM FIN MEMBER, HEAT EXCHANGER AND AIR CONDITIONER FUJIFILM Corporation (JP) 2011-01-05 EP disclosed
US-7811742-B2 Lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2010-10-12 US disclosed
US-20100203451-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-08-12 US disclosed
US-7635554-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
WO-2009121149-A1 STABILIZED PHOTOCHROMIC ADVANCED POLYMERIK PTY LTD (AU) 2009-10-08 WO disclosed
EP-2011643-A2 Planographic printing plate precursor and printing method using the same FUJIFILM Corporation (JP) 2009-01-07 EP disclosed
US-20080318171-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-20080268372-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
US-20080248421-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20070122741-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230159488-A1 APPLICATION OF HETEROCYCLIC COMPOUND CONTAINING AT LEAST TWO SULFUR ATOMS IN PREPARING NANO-VACCINE AND PREPARED NANO-VACCINE CD4, NFATC1, CTSA SMN1; SMN2 3015/4885CA14 933/4885CA12 1054/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.