1,2-Naphthoquinone

1,2-Naphthoquinone

SCHEMBL27615586

Cc1ccc(O)c(O)c1O.O=C1C=Cc2ccccc2C1=O

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.61
KDM4E B2RXH2 5/20 0.61
PTPRC P08575 4/20 0.61
MEN1 O00255 4/20 0.61
KMT2A Q03164 4/20 0.61
RECQL P46063 4/20 0.61
ALDH1A1 P00352 3/20 0.61
HPGD P15428 3/20 0.61
ALOX15 P16050 2/20 0.61
HSD17B10 Q99714 2/20 0.61
POLB P06746 2/20 0.61
THRB P10828 2/20 0.61
PTPN22 Q9Y2R2 2/20 0.61
PTPN1 P18031 2/20 0.61
IDO1 P14902 2/20 0.61
LMNA P02545 1/20 0.61
BCHE P06276 1/20 0.61
PKM P14618 1/20 0.61
ACHE P22303 1/20 0.61
CES1 P23141 1/20 0.61

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,2-Naphthoquinone SCHEMBL9009541 0.83 KDM4E (0.67) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL27595078 0.82 MAPT (0.57) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL27992980 0.81 MAPT (0.56) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL27969414 0.81 PTPRC (0.59) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL28231264 0.81 MAPT (0.59) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL27880732 0.78 PTPRC (0.91) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL15167712 0.78 PTPRC (1.00) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL29363665 0.78 PTPRC (1.00) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL173316 0.78 PTPRC (1.00) MAPTKDM4EPTPRCMEN1KMT2A
1,2-Naphthoquinone SCHEMBL27459736 0.78 PTPRC (0.69) MAPTKDM4EPTPRCMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108628094-A Photosensitive composite, cured film, colored filter and electronic device 捷恩智株式会社 2018-10-09 CN disclosed
CN-108535958-A Photosensitive composite, cured film, colored filter, interlayer dielectric and application type polarizer 捷恩智株式会社 2018-09-14 CN disclosed
CN-107918245-A Curable adhensive compositions and its cured film, the display element comprising cured film 捷恩智株式会社 2018-04-17 CN disclosed
CN-107778485-A Polyesteramide acid and the photosensitive composite containing it 捷恩智株式会社 2018-03-09 CN disclosed
CN-106959576-A Photosensitive composite and its application 捷恩智株式会社 2017-07-18 CN disclosed
CN-105954972-A A photosensitive composition, a cured membrane, a color filter, a display element, a solid shooting element, a touch screen and an LED illuminant body 捷恩智株式会社 2016-09-21 CN disclosed
CN-105607419-A PHOTOSENSITIVE COMPOSITION AND USE THEREOF JNC CORP 2016-05-25 CN disclosed
CN-104516202-A Photosensitive composition and pattern-shaped transparent body JNC CORP 2015-04-15 CN disclosed
CN-102549496-B Radiation-sensitive resin composition and method of forming interlayer dielectric SHARP KK 2014-11-26 CN disclosed
CN-102597061-B Polyimide precursor and photosensitive resin composition containing the same ASAHI KASEI E MATERIALS CORP 2014-06-04 CN disclosed
CN-101535895-A Photosensitive resin composition and flexible printed wiring board using the same ASAHI CHEMICAL IND PI R & D CO (JP) 2009-09-16 CN disclosed
CN-101256360-A Radiosensitive resin composition, laminated insulation film and micro lens, preparation method thereof JSR CORP (JP) 2008-09-03 CN disclosed
CN-101154041-A Radiation sensitive resin composition, and formation of interlayer insulating film and microlens JSR CORP (JP) 2008-04-02 CN disclosed
CN-101097404-A Homocercal chromatic radiation sensitive resin combination SUMITOMO CHEMICAL CO (JP) 2008-01-02 CN disclosed
CN-1975574-A Radiation sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2007-06-06 CN disclosed
CN-1903942-A Radiation sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2007-01-31 CN disclosed
CN-1800981-A Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO LTD (KR) 2006-07-12 CN disclosed
CN-1716095-A Radiation sensitive resin composition, cured resin and liquid crystal display device SUMITOMO CHEM ENG (JP) 2006-01-04 CN disclosed
CN-1715303-A Copolymer and its preparing method SUMITOMO CHEMICAL CO (JP) 2006-01-04 CN disclosed
CN-1716094-A Radiation sensitive resin composition SUMITOMO CHEM ENG (JP) 2006-01-04 CN disclosed