SCHEMBL27617752

SCHEMBL27617752

C=C(C)C(=O)OC(CC1CO1)=C(C)C(=O)OCC1CO1

nearest known ligand 0.67

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.67
CYP3A4 P08684 2/20 0.40
TP53 P04637 1/20 0.40
TSHR P16473 2/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
MGLL Q99685 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28806123 0.85 ALDH1A1 (0.49) ALDH1A1
SCHEMBL29031091 0.85 ALDH1A1 (0.47) ALDH1A1
SCHEMBL28150555 0.84 ALDH1A1 (0.73) ALDH1A1CYP3A4TP53TSHRCYP2D6
SCHEMBL28087566 0.83 ALDH1A1 (0.51) ALDH1A1CYP3A4TP53MGLL
SCHEMBL5098171 0.81 ALDH1A1 (1.00) ALDH1A1CYP3A4TP53TSHRCYP2D6
SCHEMBL15617 0.81 ALDH1A1 (1.00) ALDH1A1CYP3A4TP53TSHRCYP2D6
SCHEMBL5098181 0.81 ALDH1A1 (1.00) ALDH1A1CYP3A4TP53TSHRCYP2D6
SCHEMBL2048901 0.81 ALDH1A1 (1.00) ALDH1A1CYP3A4TP53TSHRCYP2D6
SCHEMBL9751485 0.80 ALDH1A1 (0.96) ALDH1A1CYP3A4TP53TSHRCYP2D6
SCHEMBL6684934 0.80 ALDH1A1 (0.96) ALDH1A1CYP3A4TP53TSHRCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118667162-A Photosensitive polyamic acid ester, preparation method thereof, photosensitive polyimide photoetching composition and application 广东粤港澳大湾区黄埔材料研究院 2024-09-20 CN claimed
CN-106317810-A Liquid crystal polymer composite film 财团法人工业技术研究院 2017-01-11 CN claimed
CN-102174141-B Method for preparing glass ionomer cement liquid with low dissolubility and acidity UNIV BEIJING CHEMICAL 2013-01-02 CN claimed
CN-118667162-A Photosensitive polyamic acid ester, preparation method thereof, photosensitive polyimide photoetching composition and application 广东粤港澳大湾区黄埔材料研究院 2024-09-20 CN disclosed
CN-109752780-A A kind of processing method of eyeglass pad pasting 浙江宝乐维科技有限公司 2019-05-14 CN disclosed
CN-109293851-A A kind of photocurable resin composition and its optical device of preparation 长兴特殊材料(苏州)有限公司 2019-02-01 CN disclosed
CN-109265693-A A kind of antibacterial agent and the preparation method and application thereof based on hemicellulose 华南理工大学 2019-01-25 CN disclosed
CN-104350076-B Polymer and nanogel materials, and methods of making and using the same 庄臣及庄臣视力保护公司 2017-05-17 CN disclosed
CN-105086872-A PVC (polyvinyl chloride) adhesive film and preparation method thereof FUJIAN SINOSHIELD INDUSTRY CO LTD 2015-11-25 CN disclosed
CN-104350076-A Polymer and nanogel materials, and methods of making and using the same JOHNSON & JOHNSON VISION CARE 2015-02-11 CN disclosed
CN-102816278-B Bio-based dimer fatty acid base vinyl ester resin as well as preparation method and application thereof INST CHEM IND FOREST PROD CAF 2014-06-04 CN disclosed
CN-103145972-A Polyether monols and polyols containing pendant acrylate and/or methacrylate esters BAYER MATERIALSCIENCE LLC 2013-06-12 CN disclosed
CN-100369945-C Process for the manufacture of epoxy-modified vinyl chloride-vinyl ester copolymer solid resins VINNOLIT GMBH & CO KG (DE) 2008-02-20 CN disclosed
CN-101092477-A Polyether monols and polyols containing pendant acrylate and/or methacrylate esters BAYER MATERIALSCIENCE LLC (US) 2007-12-26 CN disclosed
CN-100351278-C Process for producing thermally stable vinyl chloride copolymer VINNOLIT GMBH & CO KG (DE) 2007-11-28 CN disclosed
CN-1756777-A Thermally stable vinyl chloride copolymers VINNOLIT GMBH & CO KG (DE) 2006-04-05 CN disclosed
CN-1756778-A Epoxy-modified vinyl chloride-vinyl ester copolymer solid resin VINNOLIT GMBH & CO KG (DE) 2006-04-05 CN disclosed