Di(Hydroxyethyl)Ether

Di(Hydroxyethyl)Ether

SCHEMBL27630873

C=CC(=O)OCCO.OCCOCCO

nearest known ligand 0.86

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.86
ALDH1A1 P00352 5/20 0.71
TP53 P04637 3/20 0.71
HIF1A Q16665 3/20 0.71
HSD17B10 Q99714 1/20 0.71
CYP3A4 P08684 2/20 0.58
HPGD P15428 1/20 0.52
THRB P10828 3/20 0.47
MAPK1 P28482 2/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
ATM Q13315 1/20 0.31
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Triethylene Glycol SCHEMBL28416146 0.98 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
Tetraethylene Glycol SCHEMBL27403091 0.98 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1537388 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL130139 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1537403 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10530471 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL8852469 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL139735 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10533428 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1537467 0.93 TSHR (0.83) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110922330-B Preparation method of hydroxyethyl acrylate 广东新华粤石化集团股份公司 2022-08-26 CN disclosed
CN-110922330-A Preparation method of hydroxyethyl acrylate 广东新华粤石化集团股份公司 2020-03-27 CN disclosed
CN-1690853-B Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO LTD 2010-06-16 CN disclosed
CN-1690853-A Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO LTD (JP) 2005-11-02 CN disclosed