SCHEMBL27633458

SCHEMBL27633458

C=C(C)C(=O)C1(C(=O)O)CCCCC1C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GRM2 Q14416 2/20 0.33
GRM3 Q14832 2/20 0.33
GRM4 Q14833 2/20 0.33
CYP2C19 P33261 2/20 0.33
CYP1A2 P05177 1/20 0.33
ALOX15 P16050 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
GRM8 O00222 1/20 0.33
GRM6 O15303 1/20 0.33
LMNA P02545 1/20 0.33
GRM5 P41594 1/20 0.33
MTOR P42345 1/20 0.33
GRM1 Q13255 1/20 0.33
PLCB1 Q9NQ66 1/20 0.33
TSHR P16473 1/20 0.33
SLC1A2 P43004 1/20 0.30
SLC1A1 P43005 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9247852 0.82 CYP2C19 (0.35) GRM2GRM3GRM4CYP2C19CYP1A2
SCHEMBL38190 0.82 CYP2C19 (0.40) GRM2GRM3GRM4CYP2C19CYP1A2
SCHEMBL28347199 0.81 KDM4E (0.37) CYP1A2TDP1LMNATSHR
Hydrochloric Acid SCHEMBL2494923 0.80 CYP2C19 (0.39) GRM2GRM3GRM4CYP2C19CYP1A2
SCHEMBL27615428 0.80 CYP2C19 (0.39) GRM2GRM3GRM4CYP2C19CYP1A2
Cyclohexane SCHEMBL28031962 0.80 CYP2C19 (0.43) GRM2GRM3GRM4CYP2C19CYP1A2
SCHEMBL11263069 0.80 CYP2C19 (0.43) GRM2GRM3GRM4CYP2C19CYP1A2
Hydrochloric Acid SCHEMBL628239 0.80 CYP2C19 (0.39) GRM2GRM3GRM4CYP2C19CYP1A2
Hydrochloric Acid SCHEMBL28459632 0.80 CYP2C19 (0.39) GRM2GRM3GRM4CYP2C19CYP1A2
SCHEMBL29996840 0.78 CYP2C19 (0.38) GRM2GRM3GRM4CYP2C19CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110461768-A Silicon dioxide granule NIPPON CHEMICAL IND 2019-11-15 CN disclosed
CN-109476942-A Nonaqueous printing ink composition 东洋油墨SC控股株式会社 2019-03-15 CN disclosed
CN-107703658-A The manufacture method of substrate 东京应化工业株式会社 2018-02-16 CN disclosed
CN-106537253-A Solder resist composition, and coated printed wiring board 互应化学工业株式会社 2017-03-22 CN disclosed
CN-104822799-A Luminophore coating CHT R BEITLICH GMBH 2015-08-05 CN disclosed
CN-100386376-C Anisotropic conductive film forming composition CHEIL IND INC (KR) 2008-05-07 CN disclosed
CN-1796453-A Anisotropic conductive film forming composition CHEIL IND INC (KR) 2006-07-05 CN disclosed