SCHEMBL276440

SCHEMBL276440

CCC(C)CC([NH])=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL276379 0.79
SCHEMBL1509686 0.77 TDP1 (0.37)
SCHEMBL276457 0.74
SCHEMBL4984202 0.74
SCHEMBL27967722 0.74 SLC22A6 (0.43)
SCHEMBL50835 0.74
SCHEMBL3649498 0.74
SCHEMBL50834 0.74
SCHEMBL7540967 0.74
SCHEMBL27601579 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0337765-B1 ACYLSULFONAMIDE DERIVATIVES OF ALPHA-CARBOCYCLYLTOLUIC ACIDS USED AS LEUKOTRIENE ANTAGONISTS ICI AMERICAS INC. (US) 1992-10-14 EP claimed
US-5095038-A Antiinflammatory, antiallergens ICI AMERICAS INC. (US) 1992-03-10 US claimed
US-20230094952-A1 Method for Culturing Hematopoietic Stem Cells Sumitomo Pharma Co., Ltd. (JP) 2023-03-30 US disclosed
EP-4071239-A1 METHOD FOR CULTURING HEMATOPOIETIC STEM CELLS Sumitomo Pharma Co., Ltd. (JP) 2022-10-12 EP disclosed
WO-2021132627-A1 METHOD FOR CULTURING HEMATOPOIETIC STEM CELLS 大日本住友製薬株式会社 2021-07-01 WO disclosed
US-10289002-B2 Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-14 US disclosed
US-10042247-B2 Mask blank, method for manufacturing mask blank and transfer mask HOYA CORPORATION (JP) 2018-08-07 US disclosed
US-20170285460-A1 MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK HOYA CORPORATION (JP) 2017-10-05 US disclosed
US-9645494-B2 Resist underlayer film forming composition containing low molecular weight dissolution accelerator NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-05-09 US disclosed
US-9543147-B2 Photoresist and method of manufacture TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2017-01-10 US disclosed
EP-2439204-B1 HETEROCYCLIC COMPOUND AND HEMATOPOIETIC STEM CELL AMPLIFIER NISSAN CHEMICAL IND LTD (JP) 2017-01-04 EP disclosed
EP-0414058-B1 Carboxylic acid derivatives BASF AG (DE) 1994-06-15 EP disclosed
WO-1994011334-A1 SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES BASF AKTIENGESELLSCHAFT (DE) 1994-05-26 WO disclosed
US-5216171-A Nitrification inhibitors BASF AKTIENGESELLSCHAFT (DE) 1993-06-01 US disclosed
EP-0337765-B1 ACYLSULFONAMIDE DERIVATIVES OF ALPHA-CARBOCYCLYLTOLUIC ACIDS USED AS LEUKOTRIENE ANTAGONISTS ICI AMERICAS INC. (US) 1992-10-14 EP disclosed
US-5095038-A Antiinflammatory, antiallergens ICI AMERICAS INC. (US) 1992-03-10 US disclosed
US-5085685-A Herbicides BASF AKTIENGESELLSCHAFT (DE) 1992-02-04 US disclosed
EP-0453883-A2 2-amino-4-trichloropyridine derivatives BASF Aktiengesellschaft (DE) 1991-10-30 EP disclosed
EP-0414058-A2 Carboxylic acid derivatives BASF Aktiengesellschaft (DE) 1991-02-27 EP disclosed
EP-0337765-A2 Acylsulfonamide derivatives of alpha-carbocyclyltoluic acids used as leukotriene antagonists ICI AMERICAS INC. (US) 1989-10-18 EP disclosed