Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL27675338

Cc1ccc(C(=O)C(=O)c2ccccc2)c(C)c1C.N

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CES2 O00748 16/20 0.55
CES1 P23141 14/20 0.55
RAB9A P51151 1/20 0.43
LMNA P02545 1/20 0.39
MAPT P10636 1/20 0.39
XBP1 P17861 1/20 0.39
ATM Q13315 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8607227 0.98 CES2 (0.53) CES2CES1RAB9ALMNAMAPT
Ammonia Solution, Strong SCHEMBL27636626 0.98 CES2 (0.53) CES2CES1RAB9ALMNAMAPT
SCHEMBL26194156 0.98 CES2 (0.56) CES2CES1RAB9ALMNAMAPT
Ammonia Solution, Strong SCHEMBL3127805 0.85 CES2 (0.52) CES2CES1RAB9ALMNASMN1; SMN2
SCHEMBL14514161 0.84 TDP1 (0.37) CES2CES1LMNAMAPTATM
Hydrochloric Acid SCHEMBL9391095 0.84 CES2 (0.50) CES2CES1RAB9ALMNASMN1; SMN2
Benzil SCHEMBL10476771 0.83 CES2 (0.54) CES2CES1RAB9ALMNA
Benzil SCHEMBL10476773 0.83 CES2 (0.54) CES2CES1RAB9ALMNA
Benzil SCHEMBL10476776 0.83 CES2 (0.54) CES2CES1RAB9ALMNA
SCHEMBL166604 0.83 CES2 (0.54) CES2CES1RAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100439946-C Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern TOKYO OHKA KOGYO CO LTD (JP) 2008-12-03 CN disclosed
CN-1892264-A Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern TOKYO OHKA KOGYO CO LTD (JP) 2007-01-10 CN disclosed