⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1364196 | 0.92 | — | — | |
| SCHEMBL5318650 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL2580766 | 0.70 | — | — | |
| Bromide SCHEMBL8535084 | 0.70 | — | — | |
| SCHEMBL28902775 | 0.69 | — | — | |
| Trimethylammonium SCHEMBL27897908 | 0.65 | — | — | |
| SCHEMBL888115 | 0.65 | — | — | |
| SCHEMBL27838463 | 0.65 | — | — | |
| SCHEMBL22440851 | 0.64 | — | — | |
| SCHEMBL1451250 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102812155-B | Composite material comprising metal | UNIV NORTHWESTERN | 2015-05-20 | — | — | CN | disclosed |
| CN-101039999-B | Use of light-activated hardenable silicon compositions for production of thick-walled moulded articles or thick-walled coatings | GE BAYER SILICONES GMBH & CO | 2013-10-30 | — | — | CN | disclosed |
| CN-103320087-A | Liquid optical transparent organic silicon material and preparation method thereof | CAO JIANLIN | 2013-09-25 | — | — | CN | disclosed |
| CN-102812155-A | Composite material comprising metal | UNIV NORTHWESTERN | 2012-12-05 | — | — | CN | disclosed |
| CN-101495673-B | Cvd film forming method and cvd film forming apparatus | TOKYO ELECTRON LTD. (JP) | 2011-12-28 | — | — | CN | disclosed |
| CN-101495673-A | CVD film forming method and CVD film forming apparatus | TOKYO ELECTRON LTD (JP) | 2009-07-29 | — | — | CN | disclosed |
| CN-101039999-A | Use of light-activated hardenable silicon compositions for the production of thick-walled moulded articles or thick-walled coatings | GE BAYER SILICONES GMBH & CO (DE) | 2007-09-19 | — | — | CN | disclosed |