SCHEMBL888115

SCHEMBL888115

CC(C)(C)[Pt]C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22440851 0.78
SCHEMBL16680305 0.78
SCHEMBL21051674 0.73 CYP2B6 (0.35)
SCHEMBL5318650 0.73
Bromide SCHEMBL8535084 0.70
SCHEMBL1364196 0.70
Hydrochloric Acid SCHEMBL2580766 0.70
SCHEMBL28902775 0.69
SCHEMBL27838463 0.65
Trimethylammonium SCHEMBL27680775 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4237373-A1 MODIFIED CARBON-BASED MATERIALS Yissum Research Development Company of the Hebrew University of Jerusalem Ltd. (IL) 2023-09-06 EP claimed
CN-113333016-B Nano-scale KL molecular sieve loaded metal catalyst, preparation method and application 山东省科学院能源研究所 2022-12-06 CN claimed
WO-2022091105-A1 MODIFIED CARBON-BASED MATERIALS YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD. (IL) 2022-05-05 WO claimed
EP-2834309-A2 HYBRID METAL AND METAL OXIDE LAYERS WITH ENHANCED ACTIVITY Yissum Research and Development Company of The Hebrew University of Jerusalem (IL) 2015-02-11 EP claimed
WO-2013150533-A2 HYBRID METAL AND METAL OXIDE LAYERS WITH ENHANCED ACTIVITY YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD. (IL) 2013-10-10 WO claimed
US-6824816-B2 VAPOR DEPOSITION WITH ELECTROCONDUCTIVE METAL, OR ALLOY THEREOF; OXIDATION ASM INTERNATIONAL N.V. (NL) 2004-11-30 US claimed
US-20030165615-A1 Process for producing metal thin films by ALD ASM INTERNATIONAL N.V. (NL) 2003-09-04 US claimed
US-12641913-B2 Photoelectric conversion element including transition metal dichalcogenide thin film and light-receiving element including the photoelectric conversion element TANAKA KIKINZOKU KOGYO K.K. (JP) 2026-05-26 US disclosed
US-20260031365-A1 ELECTROCATALYST STRUCTURES FOR AN ELECTRODE UNIV WEST VIRGINIA (US) 2026-01-29 US disclosed
EP-3882313-B1 CURABLE FLUOROPOLYETHER-BASED RUBBER COMPOSITION AND OPTICAL COMPONENT SHINETSU CHEMICAL CO (JP) 2025-09-17 EP disclosed
US-20250267976-A1 SEMICONDUCTOR MATERIAL INCLUDING TRANSITION METAL DICHALCOGENIDE THIN FILM AND METHOD FOR PRODUCING SAME, AND LIGHT-RECEIVING ELEMENT INCLUDING THE SEMICONDUCTOR MATERIAL TANAKA KIKINZOKU KOGYO K.K. (JP) 2025-08-21 US disclosed
EP-3585729-B1 VAPOR PHASE TREATMENT OF MACROSCOPIC FORMATIONS OF CARBON NANOTUBES YISSUM RES DEV CO OF HEBREW UNIV JERUSALEM LTD (IL) 2025-04-30 EP disclosed
US-12240760-B2 Aligned carbon nanotubes ASM IP HOLDING B.V. (NL) 2025-03-04 US disclosed
WO-2005051535-A1 CATALYST AND METHOD FOR THE PREPARATION THEREOF NESTE OIL OYJ (FI) 2005-06-09 WO disclosed
US-20050020060-A1 Process for producing metal thin films by ALD AALTONEN TITTA (FI) 2005-01-27 US disclosed
US-6824816-B2 VAPOR DEPOSITION WITH ELECTROCONDUCTIVE METAL, OR ALLOY THEREOF; OXIDATION ASM INTERNATIONAL N.V. (NL) 2004-11-30 US disclosed
US-20030165615-A1 Process for producing metal thin films by ALD ASM INTERNATIONAL N.V. (NL) 2003-09-04 US disclosed
EP-0599367-B1 Focused ion beam processing with charge control SCHLUMBERGER TECHNOLOGIES INC (US) 1996-05-15 EP disclosed
US-5357116-A Focused ion beam processing with charge control SCHLUMBERGER TECHNOLOGIES, INC. (US) 1994-10-18 US disclosed
EP-0599367-A1 Focused ion beam processing with charge control SCHLUMBERGER TECHNOLOGIES, INC. (US) 1994-06-01 EP disclosed