⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13870104 | 0.95 | MEN1 (0.40) | — | |
| SCHEMBL8063791 | 0.92 | LPAR3 (0.43) | — | |
| SCHEMBL5394225 | 0.90 | LPAR3 (0.47) | — | |
| SCHEMBL891976 | 0.85 | TSHR (0.45) | — | |
| SCHEMBL827143 | 0.85 | POLB (0.48) | — | |
| SCHEMBL826294 | 0.85 | POLB (0.48) | — | |
| SCHEMBL469931 | 0.82 | POLB (0.46) | — | |
| SCHEMBL18092837 | 0.82 | TSHR (0.43) | — | |
| SCHEMBL197964 | 0.82 | POLB (0.46) | — | |
| SCHEMBL20565098 | 0.82 | POLB (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8546597-B2 | Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2013-10-01 | — | — | US | disclosed |
| EP-2194060-B1 | Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films | SHINETSU CHEMICAL CO (JP) | 2013-07-17 | — | — | EP | disclosed |
| EP-2194060-A1 | Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-09 | — | — | EP | disclosed |
| US-20100137626-A1 | ORGANIC SILANE COMPOUND FOR FORMING SI-CONTAINING FILM BY PLASMA CVD AND METHOD FOR FORMING SI-CONTAINING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-03 | — | — | US | disclosed |
| EP-1586578-A2 | Method of removing allyl series protecting group using novel ruthenium complex and method of synthesizing allyl ethers | NAGOYA UNIVERSITY (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050203317-A1 | Method of removing allyl series protecting group using novel ruthenium complex and method of synthesizing allyl ethers | NAGOYA UNIVERSITY, A NATIONAL UNIV. CORP. OF JP (JP) | 2005-09-15 | — | — | US | disclosed |
| US-6544532-B1 | For cleansing and/or treating the skin | L'OREAL (FR) | 2003-04-08 | — | — | US | disclosed |
| US-6509024-B2 | Blend of crosslinked solid polysiloxane and neutralized polyacrylamido-2-methylpropane sulfonic acid | L'OREAL (FR) | 2003-01-21 | — | — | US | disclosed |
| US-6465402-B1 | CONTAINS A CROSSLINKED SOLID ORGANOPOLYSILOXANE ELASTOMER HAVING AT LEAST ONE OXYALKYLENE GROUP AND A POLYMER WHICH IS SOLUBLE OR SWELLABLE IN WATER SUCH AS CROSSLINKED POLY(2-ACRYLAMIDO-2-METHYLPROPANESULPHONIC ACID) | L'OREAL (FR) | 2002-10-15 | — | — | US | disclosed |
| US-6419912-B1 | POLYETHERSILOXANE COPOLYMER | L'OREAL (FR) | 2002-07-16 | — | — | US | disclosed |
| US-20010041768-A1 | Composition in the form of a water-in-oil emulsion and its cosmetic uses | L'OREAL (FR) | 2001-11-15 | — | — | US | disclosed |