Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20565098 | 0.97 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL12441311 | 0.97 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL18068797 | 0.94 | POLB (0.44) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL827143 | 0.93 | POLB (0.48) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL197964 | 0.90 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL6599871 | 0.90 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL827865 | 0.90 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL472069 | 0.90 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL469931 | 0.90 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 | |
| SCHEMBL472148 | 0.90 | POLB (0.46) | POLBMEN1KMT2ACA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8143362-B2 | Composition containing unsaturated silicone compounds, dental materials containing them and use thereof | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2012-03-27 | — | — | US | claimed |
| US-20100331444-A1 | COMPOSITION CONTAINING UNSATURATED SILICONE COMPOUNDS, DENTAL MATERIALS CONTAINING THEM AND USE THEREOF | 3M ESPE AG (A WHOLLY-OWNED SUBSIDUARY OF 3M COMPANY) | 2010-12-30 | — | — | US | claimed |
| US-7807730-B2 | Composition containing unsaturated silicone compounds, dental materials containing them and use thereof | 3M ESPE AG (DE) | 2010-10-05 | — | — | US | claimed |
| EP-4551618-A1 | CATALYST COMPONENTS FOR THE POLYMERIZATION OF OLEFINS | Basell Poliolefine Italia S.r.l. (IT) | 2025-05-14 | — | — | EP | disclosed |
| WO-2024008862-A1 | CATALYST COMPONENTS FOR THE POLYMERIZATION OF OLEFINS | BASELL POLIOLEFINE ITALIA S.R.L. (IT) | 2024-01-11 | — | — | WO | disclosed |
| CN-112206765-B | Preparation method of bimetallic catalyst and application of bimetallic catalyst in synthesis of allyl ether | 万华化学集团股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-110016136-B | Novel tetracarboxylic dianhydride, polyimide resin, method for producing same, photosensitive resin composition, and method for forming pattern | 信越化学工业株式会社 | 2021-09-24 | — | — | CN | disclosed |
| US-10919918-B2 | Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| CN-112206765-A | Preparation method of bimetallic catalyst and application of bimetallic catalyst in synthesis of allyl ether | 万华化学集团股份有限公司 | 2021-01-12 | — | — | CN | disclosed |
| EP-3495434-B1 | NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS | SHINETSU CHEMICAL CO (JP) | 2020-12-30 | — | — | EP | disclosed |
| EP-3495434-A1 | NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-06-12 | — | — | EP | disclosed |
| EP-1650263-A1 | Composition containing unsaturated silicone compounds, dental materials containing them and use thereof | 3M Espe AG (DE) | 2006-04-26 | — | — | EP | disclosed |
| US-20060052646-A1 | Process for producing ether compounds in presence of a copper (II) salt | SHOWA DENKO K.K. (JP) | 2006-03-09 | — | — | US | disclosed |
| WO-2005075392-A2 | PRODUCTION PROCESS OF 3-ALKOXY-1-PROPANOLS, AND 3-ALKOXY-1-PROPANOLS OBTAINED BY THE PRODUCTION PROCESS | SHOWA DENKO K.K. (JP) | 2005-08-18 | — | — | WO | disclosed |
| EP-1551552-A1 | PROCESS FOR PRODUCING ETHER COMPOUNDS IN PRESENCE OF A COPPER (II) SALT | Showa Denko K.K. (JP) | 2005-07-13 | — | — | EP | disclosed |
| EP-1046078-B1 | LIQUID CRYSTAL DEVICE ALIGNMENT AND METHOD OF MAKING SUCH A DEVICE | HEWLETT PACKARD CO (US) | 2004-05-12 | — | — | EP | disclosed |
| US-6727968-B1 | Liquid crystal device alignment | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. | 2004-04-27 | — | — | US | disclosed |
| WO-2003106024-A1 | PROCESS FOR PRODUCING ETHER COMPOUNDS IN PRESENCE OF A COPPER (II) SALT | SHOWA DENKO K. K. (JP) | 2003-12-24 | — | — | WO | disclosed |
| WO-2003057677-A1 | ANTI-RETROVIRAL 5,6-DISUBSTITUTED ACYCLOPYRIMIDINE NUCLEOSIDE DERIVATIVES | SYDDANSK UNIVERSITET (DK) | 2003-07-17 | — | — | WO | disclosed |
| US-4725646-A | SAPONIFICATION OF A COPOLYMERIZED CARBOXYLIC ACID VINYL ESTER CROSSLINKED BY A POLYUNSATURATED POLYETHER-CONTAINING COMPOUND | JAPAN EXLAN COMPANY, LIMITED (JP) | 1988-02-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060052646-A1 | Process for producing ether compounds in presence of a copper (II) salt | ADH1C, AKR7A2, ADH1A | POLB 1280/4885MEN1 2089/4885KMT2A 1029/4885 |
| US-10919918-B2 | Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | CAD, CDH1, LCP1 | POLB 3695/4885MEN1 3052/4885KMT2A 1789/4885 |
| US-20100331444-A1 | COMPOSITION CONTAINING UNSATURATED SILICONE COMPOUNDS, DENTAL MATERIALS CONTAINING THEM AND USE THEREOF | SMCHD1, CAD, ESD | POLB 1349/4885MEN1 3290/4885KMT2A 872/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.