SCHEMBL27710293

SCHEMBL27710293

CC(C)O[Si](C)(OC(C)C)C1COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29060535 0.80
SCHEMBL29101315 0.80
SCHEMBL28879391 0.79
SCHEMBL29101310 0.76
SCHEMBL27730849 0.76
SCHEMBL28337141 0.75
SCHEMBL27730797 0.75
SCHEMBL28334792 0.75
SCHEMBL8953641 0.73 SHBG (0.31)
SCHEMBL27710230 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110573964-B Negative photosensitive resin composition and cured film 东丽株式会社 2023-11-03 CN disclosed
CN-116648353-A Resin coated ultra-thin plate glass 东丽株式会社 2023-08-25 CN disclosed
CN-110573964-A Negative photosensitive resin composition and cured film 东丽株式会社 2019-12-13 CN disclosed
CN-101646718-B Curable resin composition, protective film, and method for forming protective film JSR CORP JP 2013-04-03 CN disclosed
CN-101639628-B Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2013-04-03 CN disclosed
CN-101226329-B Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof JSR CORP 2012-09-05 CN disclosed
CN-101226329-A Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof JSR CORP (JP) 2008-07-23 CN disclosed